English
Home > Products > MOCVD

China MOCVD Manufacturers, Suppliers, Factory

We purpose to understand quality disfigurement in the creation and provide the ideal services to domestic and abroad shoppers wholeheartedly for MOCVD,TaC COATING,CVD TaC,Tantalum Carbide,Planetary Plate, Now we have established steady and long business relationships with customers from North America, Western Europe, Africa, South America, more than 60 countries and regions.
MOCVD, Our company offers the full range from pre-sales to after-sales service, from product development to audit the use of maintenance, based on strong technical strength, superior product performance, reasonable prices and perfect service, we are going to continue to develop, to offer the high-quality products and solutions and services, and promote lasting cooperation with our customers, common development and create a better future.

Related Products

Hot Products

  • Silicon Etch Plate for PSS Etching Applications

    Silicon Etch Plate for PSS Etching Applications

    Semicorex's Silicon Etch Plate for PSS Etching Applications is a high-quality, ultra-pure graphite carrier that is specifically designed for epitaxial growth and wafer handling processes. Our carrier can withstand harsh environments, high temperatures, and harsh chemical cleaning. The silicon etch plate for PSS etching applications has excellent heat distribution properties, high thermal conductivity, and is cost-effective. Our products are widely used in many European and American markets, and we look forward to becoming your long-term partner in China.
  • SiC Plate for ICP Etching Process

    SiC Plate for ICP Etching Process

    Semicorex's SiC Plate for ICP Etching Process is the perfect solution for high-temperature and harsh chemical processing requirements in thin film deposition and wafer handling. Our product boasts superior heat resistance and even thermal uniformity, ensuring consistent epi layer thickness and resistance. With a clean and smooth surface, our high-purity SiC crystal coating provides optimal handling for pristine wafers.
  • ICP Etching Wafer Holder

    ICP Etching Wafer Holder

    Semicorex's ICP etching wafer holder is the perfect solution for high-temperature wafer handling processes such as epitaxy and MOCVD. With a stable, high-temperature oxidation resistance of up to 1600°C, our carriers ensure even thermal profiles, laminar gas flow patterns, and prevent contamination or impurities diffusion.
  • MOCVD Wafer Carriers for Semiconductor Industry

    MOCVD Wafer Carriers for Semiconductor Industry

    Semicorex MOCVD Wafer Carriers for Semiconductor Industry is a top-of-the-line carrier designed for use in the semiconductor industry. Its high-purity material ensures even thermal profile and laminar gas flow pattern, delivering high-quality wafers.
  • CVD SiC Coated Graphite Susceptor

    CVD SiC Coated Graphite Susceptor

    Semicorex CVD SiC Coated Graphite Susceptor, is a specialized tool used in the handling and processing of semiconductor wafers. The susceptor plays a crucial role in facilitating the growth of thin films, epitaxial layers, and other coatings on substrates with precise control over temperature and material properties. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Porous Alumina Chucks

    Porous Alumina Chucks

    Semicorex Porous Alumina Chucks are microporous black alumina vacuum fixture with 35–40% porosity, designed to provide uniform suction and safe wafer handling in semiconductor manufacturing. Choosing Semicorex means reliable ceramic engineering, superior material quality, and consistent performance that safeguard yield and process stability.*
  • Related Blog
  • Reviews

  • Discussing CVD furnace

  • What is CVD for SiC

  • The significance of porous graphite materials to SiC crystal growth

    Semicorex's SiC crystal growth furnace component, the porous graphite barrel, will bring three major benefits and can effectively strengthen the competitiveness of domestic SiC substrates:

  • Oxidation Process

    The most basic stage of all processes is the oxidation process. The oxidation process is to place the silicon wafer in an atmosphere of oxidants such as oxygen or water vapor for high-temperature heat treatment (800~1200℃), and a chemical reaction occurs on the surface of the silicon wafer to form an oxide film (SiO2 film).

  • Application of SiC and GaN in electric vehicles

    SiC MOSFETs are transistors that offer high power density, improved efficiency, and low failure rates at high temperatures. These advantages of SiC MOSFETs bring numerous benefits to electric vehicles (EVs), including longer driving range, faster charging, and potentially lower cost battery electric vehicles (BEVs). Over the past five years, SiC MOSFETs have been widely used in the power electronics of EVs in vehicles from OEMs such as Tesla and Hyundai. In fact, SiC inverters accounted for 28% of the BEV market in 2023.

  • Application of carbon fiber composite

    Carbon fiber (CF) is a type of fibrous material that contains over 95% carbon.

Related Search

Aixtron Aix G5+ C MOCVD SystemAixtron MOCVDAmec MOCVDcvd epitaxy;epitaxy;density graphite;cvd sic coating;sic epitaxy equipment;gan on sic;gan on silicon;wafer carrier;MOCVD;epitaxial wafercvd mocvdcvd mocvd;wafer fabricationEpi and Mocvd Graphite Productsepitaxy mocvdFunction Susceptor In MOCVDGaN MOCVDGaN-MOCVD Graphite SusceptorGas Injection System For MOCVDGas Supply System For MOCVDGraphite Susceptor MOCVDled mocvdLED MOCVD SusceptorLong Life SiC Coated Graphite Heater for MOCVD K465Imbe mocvdMOCVD Aixtronmocvd applicationsMOCVD CeilingMOCVD Ceiling PlateMOCVD Ceiling PlatesMOCVD Chamber LidsMOCVD Cover PlateMOCVD Cover StarMOCVD DiscMOCVD Epitaxial GrowthMOCVD Epitaxial SiC TrayMOCVD EpitaxyMOCVD EquipmentMOCVD Equipment ManufacturersMOCVD GanMOCVD Gas Delivery SystemMOCVD Gas Distribution PlateMOCVD Gas InjectorMOCVD GearMOCVD Graphite BoatMocvd graphite susceptorMOCVD GrowthMOCVD Heat ShieldsMOCVD HeaterMOCVD Heating PlateMOCVD LEDMOCVD MachineMOCVD Middle HeaterMOCVD Precursor InjectorMOCVD ProcessMOCVD Process Gas InjectorMOCVD ReactorMOCVD Reactor DesignMOCVD Reactor SusceptorsMOCVD ReactorsMOCVD Reactors SusceptorsMOCVD Segment PlateMOCVD StarMOCVD Star DiscMOCVD Substrate HeaterMOCVD SusceptorMOCVD Susceptor ManufacturerMOCVD Susceptor SupplierMOCVD SystemMOCVD SystemsMOCVD Wafer CarrierMOCVD Wafer CarriersSatellite Platforms for MOCVDSic Boat For MOCVD And LpCVDSiC Coated Graphite Satellite Platforms for MOCVDSiC Coated MOCVD SusceptorSiC Coating MOCVD SusceptorSiC Susceptor for MOCVDSiC wafer susceptors for MocvdSiC-Coated MOCVD Reactor PartSusceptor MOCVDTaC Coating;wafer carrier trays;Semiconductor Shower Head;semiconductor components;spare parts for epitaxial;CVD TaC;CVD coating;tantalum carbide;tantalum carbide coating;MOCVDtantalum carbide;wafer chuck;vacuum chuck;tac coating;wafer carrier;EPI Susceptor;TaC-coated Graphite;SiC epitaxial;tantalum carbide tac;MOCVDVeeco K465I MOCVD SystemVeeco MOCVDVeeco MOCVD Susceptorwafer carrier;wafer susceptor;wafer holder;tantalum carbide;TaC coating;graphite plate;epitaxial growth;tantalum carbide tac;MOCVD;TaC-coated Graphitewafer chuck;tantalum carbide;vacuum chuck;tac coating;tantalum carbide price;TaC-coated Graphite;tantalum carbide coating;MOCVD;epi wafer;epitaxial componentsWafer susceptors for MOCVD

Send Inquiry

Hit enter to search or ESC to close
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept