Gas inlet rings are used to cover the wafer edge and perimeter, protecting critical chamber components to create a clean, inert, and protected environment and extending their useful life in deposition chambers, so they are exposed to plasma and high temperature during deposition or wafer processing, so strong plasma durability and high purity are critical to final wafer yield.
Semicorex CVD SiC coated rings engineered specifically for these demanding epitaxy equipment applications.
Semicorex SiC Inlet Rings are high-performance silicon carbide components engineered for semiconductor processing equipment, offering exceptional thermal stability, chemical resistance, and precision machining. Choosing Semicorex means gaining access to reliable, customized, and contamination-free solutions trusted by leading semiconductor manufacturers.*
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