SiC Focus Rings

Semicorex advanced, high-purity SiC Focus Rings are built to withstand the extreme environments in plasma etch (or dry etch) chambers. We focus on semiconductor industries such as silicon carbide layers and epitaxy semiconductor. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

Semicorex supplies SiC Focus Rings is really stable for RTA, RTP or harsh chemical cleaning. SiC Focus Rings or edge rings are designed to improve etch uniformity around the wafer edge or perimeter. Minimize contamination and unscheduled maintenance with high-purity components engineered for the rigors of plasma etch processing. Our SiC Focus Rings with SiC Coating is a dense, wear-resistant silicon carbide (SiC) coating. It has high corrosion and heat resistance properties as well as excellent thermal conductivity. We apply SiC in thin layers onto the graphite using the chemical vapor deposition (CVD) process.

Parameters of SiC Focus Rings

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300

Features of SiC Focus Rings

- CVD Silicon Carbide coatings to improve service life.

- Thermal insulation made of high-performance purified rigid carbon.

- Carbon/Carbon composite heater and plate. - Both the graphite substrate and silicon carbide layer have a high thermal conductivity, and excellent heat distribution properties.

- High-purity graphite and SiC coating for pinhole resistance and higher lifetime