English
Home > Products > Thin Film Deposition Edge Ring

China Thin Film Deposition Edge Ring Manufacturers, Suppliers, Factory

So as to provide you with ease and enlarge our business, we even have inspectors in QC Crew and guarantee you our best company and solution for Thin Film Deposition Edge Ring,Etch Residue Ring,Semiconductor Focus Ring Coating,Custom Focus Ring Solutions,High-Temperature Focus Rings, If you are fascinated in any solutions, you should experience absolutely free to make contact with us for additional details or you should send out us email instantly, we will reply you within just 24 hours and also the best quotation might be provided.
Thin Film Deposition Edge Ring, Our company has already had a lot of top factories and expert technology teams in China, offering the best solutions, techniques and services to worldwide customers. Honesty is our principle, professional operation is our work, service is our goal, and customers' satisfaction is our future!

Related Products

Hot Products

  • Seal Ring

    Seal Ring

    Semicorex provide high-quality Seal Ring with customized service. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • TaC Coated Wafer Susceptor

    TaC Coated Wafer Susceptor

    Semicorex TaC Coated Wafer Susceptor is a crucial component used in Metal-Organic Chemical Vapor Deposition (MOCVD) furnaces for semiconductor epitaxial (epi) processing. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • TaC Coating Half-moon

    TaC Coating Half-moon

    Semicorex TaC Coating Half-moon is a specialized component crafted from tantalum carbide (TaC) coated graphite, designed for use in epitaxial processes. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Alumina Tube

    Alumina Tube

    Semicorex Alumina Tube is a pivotal component in a variety of industrial applications, renowned for its ability to withstand harsh environments and high temperatures.**
  • SiC Coating Pancake Susceptor

    SiC Coating Pancake Susceptor

    Semicorex SiC Coating Pancake Susceptor is a high-performance component designed for use in MOCVD systems, ensuring optimal heat distribution and enhanced durability during epitaxial layer growth. Choose Semicorex for its precision-engineered products that deliver superior quality, reliability, and extended service life, tailored to meet the unique demands of semiconductor manufacturing.*
  • Alumina Ceramic End Effector

    Alumina Ceramic End Effector

    Semicorex Alumina Ceramic End Effector is a precision-engineered component specifically designed for reliable and contamination-free wafer handling in semiconductor manufacturing and related applications.*
  • Related Blog
  • Reviews

  • What is SOI

  • What is porous graphite?

    Porous graphite, also known as porous carbon or porous graphite material, is a graphite form that has been specially engineered to have an interconnected network of pores or voids within its structure.

  • Released 850V High Power GaN HEMT Epitaxial Products

    In November 2023, Semicorex released 850V GaN-on-Si epitaxial products for high-voltage, high-current HEMT power device applications. Compared to other substrates for HMET power devices, GaN-on-Si enables larger wafer sizes and more diversified applications, and it can also be quickly introduced into the mainstream silicon chip process in fabs, which is a unique advantage for improving the yield of power devices.

  • What is SiC coated graphite susceptor?

    In order to introduce the SiC coated graphite susceptor, it's important to understand its application. When manufacturing devices, further epitaxial layers are required to be built on some wafer substrates.

  • Substrate Cutting and Grinding Process

    SiC substrate material is the core of SiC chip. The production process of the substrate is: after obtaining the SiC crystal ingot through single crystal growth; then preparing the SiC substrate requires smoothing, rounding, cutting, grinding (thinning); mechanical polishing, chemical mechanical polishing; and cleaning, testing, etc. Process

  • Ion Implant and Diffusion Process

    Ion implantation is a method of semiconductor doping and one of the main processes in semiconductor manufacturing.

Send Inquiry

Hit enter to search or ESC to close
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept