SiC Vacuum Chucks

Semicorex Silicon Carbide SiC vacuum chucks are high-tech ceramic tools designed to safely and reliably hold semiconductor wafers during precision material removal processes. They are engineered for use in ultra-clean, high-temperature, and chemically harsh environments. SiC vacuum chucks help deliver superior wafer adsorption and alignment. Semicorex SiC vacuum chucks are manufactured from high purity silicon carbide ceramic to provide excellent mechanical strength, thermal conductivity, and chemical durability.

The main job of a vacuum chuck is to pull uniform suction across the wafer surface so that the wafer is held stable during processes like inspection, deposition, etch, and lithography. Typical vacuum chucks have problems with particle generation, warping, or chemical deterioration over time. For extreme semiconductor manufacturing conditions, SiC vacuum chucks will provide superior long-term durability and stability.

Silicon carbide materials are highly valued for their hardness, thermal stability, and low thermal expansion coefficient. These materials will remain dimensionally stable over a wide range of temperatures, allowing for thermal stability and improved process accuracy without thermal mismatch to the wafer. Their high thermal conductivity also allows for rapid heat dissipation, which is useful in rapid thermal initial ramp-up conditions or for short exposures to high-energy plasmas.

The SiC ceramic not only has thermal and mechanical benefits but also is resistant to plasma corrosion and aggressive process gases. This feature makes SiC vacuum chucks particularly favorable for dry etching, CVD, and PVD processes where quartz or aluminum nitride materials can degrade with use. The chemical inertness of SiC will aid in limiting contamination and improve tool uptime.

In order to provide superior performance. Semicorex makes  SiC vacuum chucks and specify extremely tight tolerances with ultra-flat surfaces with channel structures in update micron's. With these features, it provides wafer support with precise suction and continuous suction region for wafer support decreasing chances of warp or breakage of the wafers themselves. Custom design services are also available to suit various wafer sizes (2" to 12") in varying applications.

As higher yield, process control and reliability are factors, SiC vacuum chucks are the new essential components of next generation semiconductor equipment. The applications of SiC vacuum chucks are directly tied to yield increase, reliability of equipment and processing control.