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MOCVD Vacuum Chamber Lid

MOCVD Vacuum Chamber Lid

MOCVD Vacuum Chamber Lid used in crystal growth and wafer handling processing must endure high temperatures and harsh chemical cleaning. Semicorex Silicon Carbide Coated MOCVD Vacuum Chamber Lid engineered specifically stand up to these challenging environments. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

Semicorex Graphite components are high purity SiC coated graphite, using in the process to grow the single crystal and wafer process. The MOCVD Vacuum Chamber Lid Compound growth has high heat and corrosion resistance, are durable to experience a combination of volatile precursor gases, plasma, and high temperature.

At Semicorex, we are committed to providing high-quality products and services to our customers. We use only the best materials, and our products are designed to meet the highest standards of quality and performance. Our MOCVD Vacuum Chamber Lid is no exception. Contact us today to learn more about how we can help you with your semiconductor wafer processing needs.

Parameters of MOCVD Vacuum Chamber Lid

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase


g/cm ³



Vickers hardness


Grain Size



Chemical Purity



Heat Capacity

J·kg-1 ·K-1


Sublimation Temperature


Felexural Strength

MPa (RT 4-point)


Young’ s Modulus

Gpa (4pt bend, 1300℃)


Thermal Expansion (C.T.E)



Thermal conductivity



Features of MOCVD Vacuum Chamber Lid

● Ultra-flat capabilities

● Mirror polish

● Exceptional light weight

● High stiffness

● Low thermal expansion

● Extreme wear resistance

Hot Tags: MOCVD Vacuum Chamber Lid, China, Manufacturers, Suppliers, Factory, Customized, Bulk, Advanced, Durable

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