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China Grinding Chuck Manufacturers, Suppliers, Factory

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Grinding Chuck, We hope to have long-term cooperation relationships with our clients. If you are interested in any of our items, be sure to do not hesitate to send enquiry to us/company name. We ensure that you can be totally satisfied with our best solutions!

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Wafer Holder for ICP Etching Process
Semicorex's Wafer Holder for ICP Etching Process is the perfect choice for demanding wafer handling and thin film deposition processes. Our product boasts superior heat and corrosion resistance, even thermal uniformity, and optimal laminar gas flow patterns for consistent and reliable results.
SiC Coated MOCVD Graphite Satellite Platform
Semicorex is a reputable supplier and manufacturer of SiC Coated MOCVD Graphite Satellite Platform. Our product is specially designed to cater to the needs of the semiconductor industry in growing the epitaxial layer on the wafer chip. The product is used as the center plate in MOCVD, with a gear or ring-shaped design. It has high heat and corrosion resistance, making it ideal for use in extreme environments.
MOCVD Wafer Carriers for Semiconductor Industry
Semicorex MOCVD Wafer Carriers for Semiconductor Industry is a top-of-the-line carrier designed for use in the semiconductor industry. Its high-purity material ensures even thermal profile and laminar gas flow pattern, delivering high-quality wafers.
Wafer Carriers with SiC Coating
The Semicorex Wafer Carriers with SiC Coating, an integral part of the epitaxial growth system, is distinguished by its exceptional purity, resistance to extreme temperatures, and robust sealing properties, serving as tray that is essential for the support and heating of semiconductor wafers during the critical phase of epitaxial layer deposition, thereby optimizing the overall performance of the MOCVD process. We at Semicorex are dedicated to manufacturing and supplying high-performance Wafer Carriers with SiC Coating that fuse quality with cost-efficiency.
SiC Carrier for ICP
Semicorex SiC Carrier for ICP is a high-performance wafer holder made of SiC-coated graphite, designed specifically for use in inductively coupled plasma (ICP) etching and deposition systems. Choose Semicorex for our world-leading anisotropic graphite quality, precision small-batch manufacturing, and uncompromising commitment to purity, consistency, and process performance.*
Al2O3 Vacuum Chucks
Semicorex Al2O3 Vacuum Chucks are microporous ceramic adsorption fixture made from black alumina with a porosity of 35–40%, specifically designed for wafer handling in semiconductor applications. Choosing Semicorex means benefiting from advanced ceramic technology, precision engineering, and reliable product quality that ensure stable performance in demanding cleanroom environments.*

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Different types of SiC ceramics
Silicon carbide (SiC) ceramic is a type of advanced ceramic material known for its exceptional properties and wide range of applications. It is composed of silicon (Si) and carbon (C) atoms arranged in a crystal lattice structure, resulting in a hard and strong material with excellent thermal and electrical conductivity.
The Impact of Temperature on CVD-SiC Coatings
Chemical Vapor Deposition (CVD) is a versatile technique for producing high-quality coatings with various applications in industries such as aerospace, electronics, and materials science. CVD-SiC coatings are known for their exceptional properties, including high temperature resistance, mechanical strength, and excellent corrosion resistance.
The significance of porous graphite materials to SiC crystal growth
Semicorex's SiC crystal growth furnace component, the porous graphite barrel, will bring three major benefits and can effectively strengthen the competitiveness of domestic SiC substrates:
Why Is There Increasing Demand for High-Thermal Conductivity SiC Ceramics in the Semiconductor Industry?
Currently, silicon carbide (SiC) is a highly active area of research in thermal conductive ceramic materials both domestically and internationally.
The structure of Electrostatic Chuck(ESC)
An Electrostatic Chuck (ESC) is a device used to hold semiconductor wafers in place during processes such as etching, deposition, or polishing.
Etching Process Parameters
Etching is a critical step in chip manufacturing, used to create minute circuit structures on silicon wafers.

China Grinding Chuck Manufacturers, Suppliers, Factory

Related Products

Hot Products

Wafer Holder for ICP Etching Process

SiC Coated MOCVD Graphite Satellite Platform

MOCVD Wafer Carriers for Semiconductor Industry

Wafer Carriers with SiC Coating

SiC Carrier for ICP

Al2O3 Vacuum Chucks

Different types of SiC ceramics

The Impact of Temperature on CVD-SiC Coatings

The significance of porous graphite materials to SiC crystal growth

Why Is There Increasing Demand for High-Thermal Conductivity SiC Ceramics in the Semiconductor Industry?

The structure of Electrostatic Chuck(ESC)

Etching Process Parameters

Lynn 2024-05-07 22:41:25

Mona 2023-08-29 02:52:19

Pearl Permewan 2025-03-17 15:34:36

Prudence 2025-08-12 02:42:50

Carlos 2023-06-09 04:36:16

Dana 2023-03-23 10:07:42

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