Home > Products > Silicon Carbide Coated > ICP Etching Carrier > Silicon Carbide ICP Etching Carrier
Silicon Carbide ICP Etching Carrier

Silicon Carbide ICP Etching Carrier

Looking for a reliable wafer carrier for etching processes? Look no further than Semicorex's Silicon Carbide ICP Etching Carrier. Our product is engineered to withstand high temperatures and harsh chemical cleaning, ensuring durability and longevity. With a clean and smooth surface, our carrier is perfect for handling pristine wafers.

Send Inquiry

Product Description

Ensure optimal laminar gas flow patterns and evenness of thermal profile with Semicorex's Silicon Carbide ICP Etching Carrier. Our product is designed to achieve the best possible results for thin film deposition and wafer handling processes. With superior heat and corrosion resistance, our carrier is the perfect choice for demanding applications.

At Semicorex, we focus on providing high-quality, cost-effective products to our customers. Our Silicon Carbide ICP Etching Carrier has a price advantage and is exported to many European and American markets. We aim to be your long-term partner, delivering consistent quality products and exceptional customer service.

Contact us today to learn more about our Silicon Carbide ICP Etching Carrier.


Parameters of Silicon Carbide ICP Etching Carrier

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of Silicon Carbide ICP Etching Carrier

- Avoid peeling off and ensure coating on all surface

High temperature oxidation resistance: Stable at high temperatures up to 1600°C

High purity: made by CVD chemical vapor deposition under high temperature chlorination conditions.

Corrosion resistance: high hardness, dense surface and fine particles.

Corrosion resistance: acid, alkali, salt and organic reagents.

- Achieve the best laminar gas flow pattern

- Guarantee evenness of thermal profile

- Prevent any contamination or impurities diffusion





Hot Tags: Silicon Carbide ICP Etching Carrier, China, Manufacturers, Suppliers, Factory, Customized, Bulk, Advanced, Durable

Related Category

Send Inquiry

Please feel free to give your inquiry in the form below. We will reply you in 24 hours.
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept