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SiC Coated ICP Etching Carrier
  • SiC Coated ICP Etching CarrierSiC Coated ICP Etching Carrier
  • SiC Coated ICP Etching CarrierSiC Coated ICP Etching Carrier
  • SiC Coated ICP Etching CarrierSiC Coated ICP Etching Carrier

SiC Coated ICP Etching Carrier

Semicorex SiC Coated ICP Etching Carrier engineered specifically for epitaxy equipment with high heat and corrosion resistance in China. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

Wafer carriers used in thin film deposition phases such as epitaxy or MOCVD, or wafer handling processing such as etching must endure high temperatures and harsh chemical cleaning. Semicorex supplies high-purity SiC Coated ICP Etching Carrier provides superior heat resistance, even thermal uniformity for consistent epi layer thickness and resistance, and durable chemical resistance. Fine SiC crystal coating provides a clean, smooth surface, critical for handling since pristine wafers contact the susceptor at many points across their entire area.

Our SiC Coated ICP Etching Carrier is designed to achieve the best laminar gas flow pattern, ensuring evenness of thermal profile. This helps to prevent any contamination or impurities diffusion, ensuring high-quality epitaxial growth on the wafer chip.

Contact us today to learn more about our SiC Coated ICP Etching Carrier.


Parameters of SiC Coated ICP Etching Carrier

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of high purity SiC Coated ICP Etching Carrier

- Avoid peeling off and ensure coating on all surface

High temperature oxidation resistance: Stable at high temperatures up to 1600°C

High purity: made by CVD chemical vapor deposition under high temperature chlorination conditions.

Corrosion resistance: high hardness, dense surface and fine particles.

Corrosion resistance: acid, alkali, salt and organic reagents.

- Achieve the best laminar gas flow pattern

- Guarantee evenness of thermal profile

- Prevent any contamination or impurities diffusion




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