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SiC Cantilever Paddles
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SiC Cantilever Paddles

Semicorex SiC Cantilever Paddles are high-performance silicon carbide cantilever paddles used in semiconductor thermal processing equipment, designed for stable wafer handling in high-temperature environments. Choosing Semicorex means choosing high-purity materials, excellent thermal stability and industry-leading precision manufacturing technology to ensure that every critical process of yours is stable and reliable.*

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Product Description

Semicorex SiC Cantilever Paddles are high-performance components that are designed precisely for wafer handling and wafer transport in semiconductor thermal processing equipment (LPCVD, PECVD, oxidation, and diffusion furnaces). These cantilever paddles provide a platform for wafers and a necessary form of support which ensures stable and reliable transport of brittle wafers through harsh high-temperature processes (often exceeding 1200°C). The cantilever paddles are manufactured from high purity silicon carbide (SiC) which provides mechanical durability, thermal stability, and anti-corrosive properties for the semiconductor fabrication environment.


Silicon carbide is a super-premium ceramic material with excellent thermal conductivity, low thermal expansion, and the ability to perform reliably in chemically hostile environments. Silicon carbide in cantilever paddles can help reduce thermal warping

 and movement which keeps wafers flat and in their nominal processing position. Thermal stability of the wafer in the context of cantilever paddles is important to minimize issues of particle contamination and mechanical movement especially when producing advanced node devices. These issues can result in yield loss or costly rework and replacement of wafers.


The monolithic form of the SiC Cantilever Paddles improves mechanical robustness and thermal uniformity while eliminating joints and weak points which can typically exist in composites. Furthermore, the surface finish of the paddles is specifically controlled, and generally polished to a near mirror-quality to minimize particulate generation and is very cleanroom class compliant.


In diffusion and oxidation processes that involve oxygen, steam and other reactive gases; conventional materials may meltdown or deform over time. SiC’s inherent chemical inert property ensures the paddles will not outgas, or corrode and introduce contamination to the process due to the use of unstable materials, contributing to a more stable process and reliable results.  The structural integrity of SiC Cantilever Paddles remains stable despite rapid cycling of heating and cooling. Therefore, they offer long operational service life with greatly reduced maintenance or part replacement downtime.


In addition, the reduced mass and light weight of SiC paddles allow for a faster thermal response; thereby allowing for faster thermal ramp-up and cool-down times contributing to increased productivity and energy efficiency, all major metrics in the competitive landscape of semiconductor manufacture.


SiC Cantilever Paddles can be supplied in a variety of configurations and sizes, designed and manufactured to accommodate various furnace designs and wafer sizes ranging from 100 mm to 300 mm and larger. OEMs and equipment integrators appreciate the consistency and reliability of the SiC paddles over time, for deployments in both front-end and back-end processes.


Semicorex offers premium SiC Cantilever Paddles with tight control on material purity, microstructure, and dimensional tolerances. Our advanced process capabilities, coupled with our knowledge of semiconductor thermal dynamics, allow us to produce paddles with these attributes that meet or exceed industry standards for stability, cleanliness, and durability. When it needs to be right and reliable, Semicorex is the place to go for quality SiC components.


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