English
Home > Products > Porous graphite sheets

China Porous graphite sheets Manufacturers, Suppliers, Factory

We depend on sturdy technical force and continually create sophisticated technologies to meet the demand of Porous graphite sheets,Porous graphite,Graphite foam,High-porosity graphite,Graphite material properties, Welcome around the world customers to make contact with us for enterprise and long-term cooperation. We're going to be your trustworthy partner and supplier of auto pieces and accessories in China.
Porous graphite sheets, We always insist on the management tenet of "Quality is first, Technology is basis, Honesty and Innovation".We've been able to develop new products and solutions continuously to a higher level to satisfy different needs of customers.

Related Products

Hot Products

  • Diffusion Tube

    Diffusion Tube

    Semicorex cutting-edge Diffusion Tube, crafted from high-quality semiconductor grade quartz—a pinnacle in semiconductor processing technology. Engineered to precision, this indispensable component redefines the standards of diffusion processes in the semiconductor industry. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Wafer Carrier for MOCVD

    Wafer Carrier for MOCVD

    the Semicorex Wafer Carrier for MOCVD, Crafted for the precise needs of Metal Organic Chemical Vapor Deposition (MOCVD), emerges as an indispensable tool in the processing of single-crystal Si or SiC for high-scale integrated circuits. The Wafer Carrier for MOCVD composition boasts unparalleled purity, resistance to elevated temperatures and corrosive environments, and superior sealing properties to maintain a pristine atmosphere. We at Semicorex are dedicated to manufacturing and supplying high-performance Wafer Carriers for MOCVD that fuse quality with cost-efficiency.
  • Lithography Machine Skeleton

    Lithography Machine Skeleton

    Semicorex lithography machine skeleton is an essential structural component designed to support and stabilize the intricate machinery involved in photolithography processes. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Si Substrate

    Si Substrate

    Semicorex Si Substrate is designed with precision and reliability to meet the exacting standards of semiconductor manufacturing. Choosing Semicorex means choosing a substrate that is meticulously crafted to deliver consistent performance across all applications. Our Si Substrate undergo rigorous quality control, ensuring minimal impurities and defects, and are available in custom specifications to match the needs of cutting-edge technology.*
  • SiC Epi Wafers

    SiC Epi Wafers

    Semicorex SiC epi wafers are becoming a key material for promoting technological innovation in high-frequency, high-temperature, and high-power application scenarios due to their excellent physical properties. Semicorex SiC Epi Wafers use industry-leading epitaxial growth technology and are designed to meet the high-end needs of new energy vehicles, 5G communications, renewable energy, and industrial power supplies, providing customers with high-performance, high-reliability core semiconductor solutions.*
  • Guide Ring

    Guide Ring

    Semicorex Guide Ring with CVD tantalum carbide coating is a highly reliable and advanced component for SiC single crystal growth furnaces. Its superior material properties, durability, and precision-engineered design make it an essential part of the crystal growth process. By choosing our high-quality Guide Ring, manufacturers can achieve enhanced process stability, higher yield rates, and superior SiC crystal quality.*
  • Related Blog
  • Reviews

  • What is a MOCVD system?

  • Knowing Cantilever Paddle

  • Dry Etching vs Wet Etching

    In semiconductor fabrication, etching is one of the major steps, along with photolithography and thin-film deposition. It involves removing unwanted materials from the surface of a wafer using chemical or physical methods. This step is carried out after coating, photolithography, and developing. It is used to remove the exposed thin film material, leaving only the desired portion of the wafer, and then removing the excess photoresist. These steps are repeated numerous times to create complex integrated circuits.

  • Can you grind silicon carbide?

    Silicon carbide (SiC) has important applications in areas such as power electronics, high-frequency RF devices, and sensors for high-temperature-resistant environments due to its excellent physicochemical properties. However, the slicing operation during SiC wafer processing introduces damages on the surface, which, if left untreated, can expand during the subsequent epitaxial growth process and form epitaxial defects, thus affecting the yield of the device.

  • Substrate vs. Epitaxy: Key Roles in Semiconductor Manufacturing

    ​In the realms of semiconductor technology and microelectronics, the concepts of substrates and epitaxy hold significant importance. They play critical roles in the manufacturing process of semiconductor devices. This article will delve into the differences between semiconductor substrates and epitaxy, covering their definitions, functions, material structures, and application areas.

  • Silicon Carbide Ceramics and Their Diverse Fabrication Processes

    This paper provides a comprehensive overview of the various manufacturing techniques employed to produce dense SiC ceramics, highlighting their unique characteristics and applications.

Send Inquiry

Hit enter to search or ESC to close
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept