China Ceramic Grinding Barrel Manufacturers, Suppliers, Factory

Dependable high-quality and fantastic credit standing are our principles, which will help us at a top-ranking position. Adhering to your tenet of "quality very first, client supreme" for Ceramic Grinding Barrel,SiSiC,SIC,silicon carbide,Silicon Carbide Ceramic Grinding Barrel, We welcome new and previous consumers from all walks of lifestyle to speak to us for upcoming business enterprise associations and mutual results!
Ceramic Grinding Barrel, Our products are widely recognized and trusted by users and can meet continuously changing of economic and social needs. We welcome new and old customers from all walks of life to contact us for future business relationships and mutual success!

Hot Products

  • ICP Plasma Etching Plate

    ICP Plasma Etching Plate

    Semicorex's ICP Plasma Etching Plate provides superior heat and corrosion resistance for wafer handling and thin film deposition processes. Our product is engineered to withstand high temperatures and harsh chemical cleaning, ensuring durability and longevity. With a clean and smooth surface, our carrier is perfect for handling pristine wafers.
  • ICP Plasma Etching System

    ICP Plasma Etching System

    Semicorex's SiC Coated carrier for ICP Plasma Etching System is a reliable and cost-effective solution for high-temperature wafer handling processes such as epitaxy and MOCVD. Our carriers feature a fine SiC crystal coating that provides superior heat resistance, even thermal uniformity, and durable chemical resistance.
  • CVD Chemical Vapor Deposition Furnaces

    CVD Chemical Vapor Deposition Furnaces

    Semicorex CVD Chemical Vapor Deposition furnaces make the manufacture of high-quality epitaxy more efficient. We provide custom furnace solutions. Our CVD Chemical Vapor Deposition furnaces have a good price advantage and cover most of the European and American markets. We look forward to becoming your long-term partner in China.
  • TaC Coated Porous Graphite

    TaC Coated Porous Graphite

    Semicorex TaC Coated Porous graphite, is an advanced high-purity material on semiconductor processing. This crucial piece of equipment plays a pivotal role in the process of single crystal SiC growth. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Quartz Chamber

    Quartz Chamber

    Semicorex Quartz Chamber is an indispensable asset in the etching processes of semiconductor manufacturing and other high-tech industries. With its unique features and broad application range, it delivers superior performance and reliability. By choosing Semicorex’s Quartz Chamber, you are ensuring the highest quality etching results, backed by our unwavering commitment to innovation and customer support. Elevate your etching processes today with our advanced Quartz Chamber technology.*
  • Quartz Crucible for Silicon Single Crystal Pulling

    Quartz Crucible for Silicon Single Crystal Pulling

    Semicorex Quartz Crucible for Silicon Single Crystal Pulling is made of high-quality fused quartz, the crucible has multiple layers, the inner layer is extremely high quality and dense to ensure the quality of single crystal. Semicorex is professional for the Quartz Crucible for Silicon Single Crystal Pulling products with extensive experience.*

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