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Semiconductor Wafer Chuck

Semiconductor Wafer Chuck

Semicorex advanced, high-purity Silicon Carbide Coated Components are built to withstand the extreme environments in wafer handling process. Our Semiconductor Wafer Chuck has a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

Semicorex ultra-flat Semiconductor Wafer Chuck is high purity SiC coated using in the wafer handling process. Semiconductor Wafer Chuck by MOCVD equipment Compound growth has high heat and corrosion resistance, which has great stability in extreme environment, and improve yield management for semiconductor wafer processing. Low-surface-contact configurations minimize the risk of back-side particles for sensitive applications.


Parameters of Semiconductor Wafer Chuck

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of Semiconductor Wafer Chuck

- CVD Silicon Carbide coatings to improve service life.

- Ultra-flat capabilities

- High stiffness

- Low thermal expansion

- Extreme wear resistance




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