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"Control the quality by the details, show the strength by quality". Our company has strived to establish a highly efficient and stable staff team and explored an effective quality control process for Silicon Wafer Handling Tools,Wafer Handling Equipment,Electrostatic Chuck Semiconductor,Wafer Vacuum Sucker,Sic Chuck, Welcome any inquiry to our firm. We will be happy to ascertain helpful business enterprise relationships along with you!
Silicon Wafer Handling Tools, We strongly believe that technology and service is our base today and quality will create our reliable walls of future. Only we've better and better quality , could we achieve our customers and ourselves, too. Welcome customers all over the word to contact us for getting further business and reliable relationships. We have been always here working for your demands whenever you want.

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    Semicorex Alumina Ceramic Wafer Chucks not limited to a single industry; their unique properties make them suitable for a wide range of applications. In the semiconductor sector, they are used for holding wafers during chip fabrication. In the chemical industry, their corrosion resistance makes them ideal for handling aggressive substances. Environmental applications benefit from their stability and resistance to wear, while their mechanical properties are leveraged in the development of functional materials.We at Semicorex are dedicated to manufacturing and supplying high-performance Alumina Ceramic Wafer Chucks that fuse quality with cost-efficiency.
  • Al2O3 Substrate

    Al2O3 Substrate

    Semicorex proudly presents the Al2O3 Substrate, a versatile and high-performance material crafted from high-purity aluminum oxide (alumina). This advanced ceramic substrate is lauded for its exceptional properties, making it a cornerstone in various high-tech industries, including electronics, optoelectronics, and solid oxide fuel cells.**
  • Porous Ceramic Vacuum Chuck

    Porous Ceramic Vacuum Chuck

    Semicorex Porous Ceramic Vacuum Chuck's primary function lies in its ability to provide uniform air and water permeability, a feature that ensures the even distribution of stress and robust adhesion of silicon wafers. This characteristic is crucial during the grinding process, as it prevents the wafer from slipping, thereby maintaining the integrity of the operation.**
  • SiC Robot Arm

    SiC Robot Arm

    Semicorex SiC Robot Arm is a high-performance silicon carbide ceramic robotic arm designed for precision and durability in semiconductor manufacturing processes. Choose Semicorex for our expertise in delivering innovative, reliable, and high-quality solutions tailored to the semiconductor industry's needs.*
  • Glassy Carbon Coating Felt

    Glassy Carbon Coating Felt

    Semicorex Glassy Carbon Coating Felt is a premium-grade insulation material designed to deliver exceptional thermal performance and process cleanliness in SiC epitaxial growth systems. Choose Semicorex for unmatched expertise in engineered carbon solutions, consistent product quality, and a deep commitment to supporting next-generation semiconductor manufacturing.*
  • SiC wafer Grinding Plate

    SiC wafer Grinding Plate

    Advanced SiC wafer grinding plate from Semicorex is the precision machining part for achieving ultra-high flatness on semiconductor wafer surfaces. Selecting Semicorex SiC wafer grinding plate goes beyond selecting a high-performance tool, it secures the optimal, accurate, stable and efficient solution for wafer grinding applications.
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  • What is the advantage of silicon carbide?

  • Why choose SiC-coated graphite susceptors?

    Graphite susceptor is one of the essential parts in the MOCVD equipment, is the carrier and the heater of the wafer substrate. Its properties of thermal stability and thermal uniformity play a decisive role in the quality of wafer epitaxial growth, which directly determines the uniformity and purity of the layer materials, in a result its quality directly affects the preparation of epitaxy.

  • What is isostatic graphite?

    Specialty graphite is graphite with carbon mass fraction greater than 99.99%, also known as "three high graphite" (high strength, high density, high purity). It is characterized by high strength, high density, high purity, high chemical stability, high thermal and electrical conductivity, high temperature resistance, radiation resistance, strong lubrication and easy processing. Isostatic graphite belongs to specialty graphite.

  • Advantages and Disadvantages of Gallium Nitride (GaN) Applications

    As the world looks for new opportunities in semiconductors, gallium nitride continues to stand out as a potential candidate for future power and RF applications. However, for all the benefits it offers, it still faces a major challenge; there are no P-type (P-type) products. Why is GaN touted as the next major semiconductor material, why is the lack of P-type GaN devices a major drawback, and what does this mean for future designs?

  • Main steps in SiC substrate processing

    The processing of 4H-SiC substrate mainly includes the following steps:

  • Synthesizing High-Purity Silicon Carbide Powder

    High-Purity Silicon Carbide Powder features exceptional wide bandgap characteristics, which make it an ideal material for manufacturing high-frequency, high-power electronic devices.

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