English
Home > Products > wafer processing

China wafer processing Manufacturers, Suppliers, Factory

Our commission is to serve our buyers and purchasers with most effective good quality and aggressive portable goods for wafer processing,quartz tank,silicon wafer cleaning,wafer cleaning kit,wafer cleaning machine, We welcome new and outdated prospects from all walks of lifetime to get in touch with us for foreseeable future small business interactions and mutual achievement!
wafer processing, We'll supply much better products and solutions with diversified designs and expert services. At the same time, welcome OEM, ODM orders, invite friends at home and abroad together common development and achieve win-win, integrity innovation, and expand business opportunities! If you have any question or need more information be sure to feel free to contact us. We are looking forward to receiving your enquiries soon.

Related Products

Hot Products

  • High-Temperature SiC-Coated Barrel Susceptor

    High-Temperature SiC-Coated Barrel Susceptor

    When it comes to semiconductor manufacturing, the Semicorex High-Temperature SiC-Coated Barrel Susceptor is the top choice for superior performance and reliability. Its high-quality SiC coating and exceptional thermal conductivity make it ideal for use in even the most demanding high-temperature and corrosive environments.
  • Ceramic Wafer Boat

    Ceramic Wafer Boat

    Semicorex provides wafer boats, pedestals, and custom wafer carriers for both vertical / column and horizontal configurations. We have been manufacturer and supplier of silicon carbide coating film for many years. Our Ceramic Wafer Boat has a good price advantage and cover most of the European and American markets. We look forward to becoming your long-term partner in China.
  • SiC Heating Element Heater Filament SiC Rods

    SiC Heating Element Heater Filament SiC Rods

    Semicorex SiC Heating Element Heater Filament SiC Rods, is a specialized tool used in the handling and processing of semiconductor wafers. This crucial piece of equipment plays a pivotal role in creating the optimal thermal environment necessary for the production of high-quality semiconductor devices. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Isostatic Graphite Crucible

    Isostatic Graphite Crucible

    Semicorex Isostatic Graphite Crucible is a specialized vessel used in the thermal processing of semiconductor materials, particularly in the production of monocrystals. It plays a crucial role in the controlled growth of single-crystal structures essential for semiconductor device fabrication. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Quartz Chamber

    Quartz Chamber

    Semicorex Quartz Chamber is an indispensable asset in the etching processes of semiconductor manufacturing and other high-tech industries. With its unique features and broad application range, it delivers superior performance and reliability. By choosing Semicorex’s Quartz Chamber, you are ensuring the highest quality etching results, backed by our unwavering commitment to innovation and customer support. Elevate your etching processes today with our advanced Quartz Chamber technology.*
  • Carbon Carbon Crystallizer Tanks

    Carbon Carbon Crystallizer Tanks

    Semicorex Carbon Carbon Crystallizer Tanks are high-strength, high-temperature vessels made from premium carbon-carbon composite. Choose Semicorex for superior material quality, precision engineering, and reliable performance in extreme environments.*
  • Related Blog
  • Reviews

  • What is epitaxial wafer process?

    Epitaxial wafer process is a critical technique used in semiconductor manufacturing. It involves the growth of a thin layer of crystal material on top of a substrate, which has the same crystal structure and orientation as the substrate. This process creates a high-quality interface between the two materials, allowing for the development of advanced electronic devices.

  • Application Scenarios for Epitaxial Layers

    We know that further epitaxial layers need to be built on top of some wafer substrates for device fabrication, typically LED light-emitting devices, which require GaAs epitaxial layers on top of silicon substrates; SiC epitaxial layers are grown on top of conductive SiC substrates for building devices such as SBDs, MOSFETs, etc. for high voltage, high current and other power applications; GaN epitaxial layers are built on top of semi-insulating SiC substrates for building HEMTs and other RF applications.

  • What is cantilever paddles?

    The wafer boats, loaded with a batch of wafers to be processed, are positioned on long cantilevered paddles.

  • A Brief History of Silicon Carbide and Applications of Silicon Carbide Coatings

    The history of silicon carbide (SiC) dates back to 1891, when Edward Goodrich Acheson accidentally discovered it while attempting to synthesize artificial diamonds. Acheson heated a mixture of clay (aluminosilicate) and powdered coke (carbon) in an electric furnace. Instead of the expected diamonds, he obtained a bright green crystal adhering to the carbon. This crystal had a hardness second only to diamond, and was thus named carborundum. In 1904, French-Jewish chemist Henri Moissan discovered rare natural silicon carbide minerals while studying meteorite samples from the Diablo Canyon in Arizona, USA. He named these minerals moissanite, and his discovery earned him the 1906 Nobel Prize in Chemistry.

  • Heteroepitaxy of 3C-SiC: An Overview

    The development of 3C-SiC, a significant polytype of silicon carbide, reflects the continuous advancement of semiconductor material science. In the 1980s, Nishino et al. first achieved a 4 μm thick 3C-SiC film on a silicon substrate using chemical vapor deposition (CVD)[1], laying the foundation for 3C-SiC thin-film technology.

  • The Fatal Flaw of GaN

    ​As the world searches for new opportunities in the semiconductor field, Gallium Nitride (GaN) continues to stand out as a potential candidate for future power and RF applications. However, despite its numerous benefits, GaN faces a significant challenge: the absence of P-type products. Why is GaN hailed as the next major semiconductor material, why is the lack of P-type GaN devices a critical drawback, and what does this mean for future designs?

Related Search

150 mm Wafer ProcessingCeramic Boat For Wafer ProcessingCeramic Wafer Processingicp etch;icp rie;silicon carbide susceptor;wafer carrier;dry etch;cvd sic coating;high purity graphite;graphite susceptor;wafer processing;wafer fabQuartz Boat For Wafer Processingquartz tank;silicon wafer cleaning;wafer cleaning kit;wafer cleaning machine;quartz bath;fused silica glass;fused quartz price;foup cleaning;wafer container;wafer processingRBSiC;SSiC;wafer inspection;sic ceramic;CVD SiC;wafer inspection tools;wafer processing;semiconductor manufacturing process;high purity SiC;RBSiCseal ring;sealing application;tac coat;tantalum carbide;tantalum carbide coating;o ring for vacuum sealing;high vacuum o rings;gas seal;semiconductor manufacturing;wafer processing;Semicon Wafer Processing BoatSemiconductor Wafer Processing Boatsic ceramic;cvd silicon carbide;RBSiC;SSiC;silicon carbide ceramic coating;;silicon carbide tubes;diffusion process;wafer processing;solar cell manufacturingSiC ceramic;high purity SiC;Silicon carbide;SiC spare part;silicon carbide ceramic;RBSiC;SSiC;RSiC;wafer processing;SiC for semiconductorWafer ProcessingWafer Processing Boat

Send Inquiry

Hit enter to search or ESC to close
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept