China tantalum carbide coatings Manufacturers, Suppliers, Factory

Well-run tools, qualified sales crew, and superior after-sales providers; We are also a unified huge spouse and children, all people keep on with the corporate value "unification, devotion, tolerance" for tantalum carbide coatings,tantalum carbide tac,TaC coated,MOCVD,wafer susceptor, We're looking ahead to forming thriving business enterprise relationship with new clients in the in the vicinity of future!
tantalum carbide coatings, We pay high attention to customer service, and cherish every customer. We've maintained a strong reputation in the industry for many years. We are honest and work on building a long-term relationship with our customers.

Hot Products

  • Inductively-Coupled Plasma (ICP)

    Inductively-Coupled Plasma (ICP)

    Semicorex's silicon carbide coated susceptor for Inductively-Coupled Plasma (ICP) is designed specifically for high-temperature wafer handling processes such as epitaxy and MOCVD. With a stable, high-temperature oxidation resistance of up to 1600°C, our carriers ensure even thermal profiles, laminar gas flow patterns, and prevent contamination or impurities diffusion.
  • SiC Bearing

    SiC Bearing

    Semicorex SiC Bearing with its exceptional hardness, strength, and chemical inertness, has emerged as a cornerstone material for engineering demanding applications across diverse industries. When crafted into bearings, SiC unlocks a new level of performance and reliability, particularly in environments characterized by extreme temperatures, corrosive substances, and stringent purity requirements. We at Semicorex are dedicated to manufacturing and supplying high-performance SiC Bearing that fuses quality with cost-efficiency.**
  • CVD TaC Coating Cover

    CVD TaC Coating Cover

    Semicorex CVD TaC Coating Cover has been becoming a critical enabling technology in the demanding environments within epitaxy reactors, characterized by high temperatures, reactive gases, and stringent purity requirements, necessitate robust materials to ensure consistent crystal growth and prevent unwanted reactions.**
  • CFC U-Channel

    CFC U-Channel

    Semicorex CFC U-Channel offers increased strength and excellent thermal performance in high-temperature environments, enabling processing efficiency and reliability.
  • Porous SiC Chuck

    Porous SiC Chuck

    Semicorex Porous SiC Chuck is a high-performance ceramic vacuum chuck designed for secure and uniform wafer adsorption in semiconductor processing. Its engineered micro-porous structure ensures excellent vacuum distribution, making it ideal for precision applications.*
  • SiC coated graphite tray

    SiC coated graphite tray

    SiC coated graphite tray is a cutting-edge semiconductor part that gives Si substrates precise temperature control and stable support during the silicon epitaxial growth process. Semicorex always give top priority to customer demand, providing customers with core component solutions required for the production of high-quality semiconductors.

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