China plasma etch Manufacturers, Suppliers, Factory

Our enterprise insists all along the quality policy of "product high-quality is base of organization survival; customer gratification will be the staring point and ending of an company; persistent improvement is eternal pursuit of staff" and also the consistent purpose of "reputation very first, purchaser first" for plasma etch,dry etch;,icp etching,inductively coupled plasma etching,wafer etching, In addition, we would properly tutorial the purchasers about the application techniques to adopt our items plus the way to select appropriate materials.
plasma etch, Our advanced equipment, excellent quality management, research and development ability make our price down. The price we offering may not be the lowest, but we guarantee it is absolutely competitive! Welcome to contact us immediately for future business relationship and mutual success!

Hot Products

  • GaN Epitaxy Carrier

    GaN Epitaxy Carrier

    The Semicorex GaN Epitaxy Carrier is pivotal in semiconductor manufacturing, integrating advanced materials and precision engineering. Distinguished by its CVD SiC coating, this carrier offers exceptional durability, thermal efficiency, and protective capabilities, establishing itself as a standout in the industry. We at Semicorex are dedicated to manufacturing and supplying high-performance GaN Epitaxy Carrier that fuse quality with cost-efficiency.
  • Tantalum Carbide Coating Chuck

    Tantalum Carbide Coating Chuck

    Semicorex Tantalum Carbide Coating Chuck is a precision-engineered component designed for use in high-temperature and high-stress environments. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Si Substrate

    Si Substrate

    Semicorex Si Substrate is designed with precision and reliability to meet the exacting standards of semiconductor manufacturing. Choosing Semicorex means choosing a substrate that is meticulously crafted to deliver consistent performance across all applications. Our Si Substrate undergo rigorous quality control, ensuring minimal impurities and defects, and are available in custom specifications to match the needs of cutting-edge technology.*
  • CFC Rod

    CFC Rod

    Semicorex CFC Rod is specially designed for use in load-bearing applications, such as shafts in high-temperature vacuum furnaces and specialized atmosphere ovens.
  • Alumina Fastener

    Alumina Fastener

    Semicorex Alumina Fastener is integral to the construction of equipment used in chemical vapor deposition (CVD), ion implantation, photolithography, and semiconductor manufacturing.
  • Semiconductor Graphite Heater

    Semiconductor Graphite Heater

    Semicorex semiconductor graphite heater is a high-efficiency heating device made from high-quality isostatic graphite. It is widely used in the core process links of semiconductor manufacturing, such as the thermal field of crystal growth furnaces, epitaxial growth processes, ion implantation equipment, plasma etching equipment, and the production of semiconductor device sintering molds.

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