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SiC Coated Barrel Susceptor for Epitaxial Growth

SiC Coated Barrel Susceptor for Epitaxial Growth

With its superior density and thermal conductivity, the Semicorex SiC Coated Barrel Susceptor for Epitaxial Growth is the ideal choice for use in high-temperature and corrosive environments. Coated with high-purity SiC, this graphite product provides excellent protection and heat distribution, ensuring reliable and consistent performance in semiconductor manufacturing applications.

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Product Description

The Semicorex SiC Coated Barrel Susceptor for Epitaxial Growth is the perfect choice for epixial layer formation on semiconductor wafers, thanks to its excellent thermal conductivity and heat distribution properties. Its silicon carbide coating provides superior protection in even the most demanding high-temperature and corrosive environments.

At Semicorex, we focus on providing high-quality, cost-effective products to our customers. Our SiC Coated Barrel Susceptor for Epitaxial Growth has a price advantage and is exported to many European and American markets. We aim to be your long-term partner, delivering consistent quality products and exceptional customer service.


Parameters of SiC Coated Barrel Susceptor for Epitaxial Growth

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of SiC Coated Barrel Susceptor for Epitaxial Growth

- Both the graphite substrate and silicon carbide layer have good density and can play a good protective role in high temperature and corrosive working environments.

- Silicon carbide coated susceptor used for single crystal growth has a very high surface flatness.

- Reduce the difference in thermal expansion coefficient between the graphite substrate and silicon carbide layer, effectively improve the bonding strength to prevent cracking and delamination.

- Both the graphite substrate and silicon carbide layer have a high thermal conductivity, and excellent heat distribution properties.

- High melting point, high temperature oxidation resistance, corrosion resistance.




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