English
Home > Products > icp rie

China icp rie Manufacturers, Suppliers, Factory

continue to enhance, to be certain solution top quality in line with market and buyer standard requirements. Our corporation has a excellent assurance program are actually established for icp rie,cvd sic process,plasma etching,dry etching,wafer etching, We are looking forwards to establishing long-term business relationships with worldwide customers.
icp rie, We solution have passed through the national skilled certification and been well received in our key industry. Our specialist engineering team will often be ready to serve you for consultation and feedback. We are able to also provide you with no cost samples to meet your needs. Best efforts might be produced to offer you the very best service and solutions. For anyone who is considering our business and solutions, make sure you speak to us by sending us emails or get in touch with us right away. As a way to know our items and enterprise. lot more, you'll be able to come to our factory to find out it. We will constantly welcome guests from around the globe to our firm. o build enterprise. elations with us. Be sure to truly feel absolutely free to make contact with us for small business and we believe we are going to share the top trading practical experience with all our merchants.

Related Products

Hot Products

  • Mechanical Seal Ring

    Mechanical Seal Ring

    Semicorex provide high-quality Mechanical Seal Ring customized service. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • SiC Seal Parts

    SiC Seal Parts

    Semicorex SiC seal parts, or Silicon Carbide seal parts, represent a cutting-edge and highly efficient solution for various industrial applications where sealing integrity is paramount. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Silicon Wafer

    Silicon Wafer

    Semicorex silicon wafer is a thin, circular slice of silicon crystal used in the fabrication of integrated circuits and other microdevices. Typically, these wafers are produced through a meticulous process involving growing a single crystal ingot of high-purity silicon and then precisely slicing it into thin discs. Silicon wafers serve as the fundamental substrate upon which semiconductor devices are built. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Wafer Carriers with SiC Coating

    Wafer Carriers with SiC Coating

    The Semicorex Wafer Carriers with SiC Coating, an integral part of the epitaxial growth system, is distinguished by its exceptional purity, resistance to extreme temperatures, and robust sealing properties, serving as tray that is essential for the support and heating of semiconductor wafers during the critical phase of epitaxial layer deposition, thereby optimizing the overall performance of the MOCVD process. We at Semicorex are dedicated to manufacturing and supplying high-performance Wafer Carriers with SiC Coating that fuse quality with cost-efficiency.
  • Graphite Rotor and Shaft

    Graphite Rotor and Shaft

    Semicorex graphite rotor and shaft assemblies are crucial parts that are mostly used for degassing in the smelting of aluminium and aluminium alloys.
  • Alumina Ceramic End Effector

    Alumina Ceramic End Effector

    Semicorex Alumina Ceramic End Effector is a precision-engineered component specifically designed for reliable and contamination-free wafer handling in semiconductor manufacturing and related applications.*
  • Related Blog
  • Reviews

  • MOCVD is the key equipment

  • What is CVD for SiC

  • Taiwan's PSMC to Build 300mm Wafer Fab in Japan

    Taiwan's Power Semiconductor Manufacturing Corporation (PSMC) has announced plans to build a 300mm wafer fab in Japan in collaboration with SBI Holdings. The purpose of this collaboration is to strengthen Japan's domestic IC (integrated circuit) supply chain, with a particular focus on circuits for AI edge computing and packaging technologies.

  • Application and Development Challenges of TaC Coated Graphite Components

    The third-generation wide bandgap semiconductor materials, such as Gallium Nitride (GaN) and Silicon Carbide (SiC), are renowned for their exceptional optoelectronic conversion and microwave signal transmission capabilities. These materials meet the demanding requirements of high-frequency, high-temperature, high-power, and radiation-resistant electronic devices. Therefore, they have vast application prospects in new-generation mobile communications, new energy vehicles, smart grids, and LED technologies. The comprehensive development of the third-generation semiconductor industry urgently requires breakthroughs in key core technologies, continual advancement in device design and innovation, and a resolution to import dependencies.

  • Understanding Dry Etching Technology in the Semiconductor Industry

    Currently, many semiconductor devices employ mesa device structures, which are predominantly created through two types of etching: wet etching and dry etching. While the simple and rapid wet etching plays a significant role in semiconductor device fabrication, it has inherent drawbacks such as isotropic etching and poor uniformity, which result in limited control when transferring small-sized patterns. Dry etching, however, with its high anisotropy, good uniformity, and repeatability, has become prominent in semiconductor device fabrication processes. The term “dry etching” broadly refers to any non-wet etching technology used for removing surface materials and transferring micro and nano patterns, including laser etching, plasma etching, and chemical vapor etching. The dry etching discussed in this text specifically pertains to the narrow application of processes using plasma discharge—either physical or chemical—to modify material surfaces.

  • Method of GaN Crystal Growth

    When producing large-sized GaN single crystal substrates, HVPE is currently the best choice for commercialization. However, the back carrier concentration of the grown GaN cannot be precisely controlled.

Related Search

icp etch;icp rie;silicon carbide susceptor;wafer carrier;dry etch;cvd sic coating;high purity graphite;graphite susceptor;wafer processing;wafer fab

Send Inquiry

Hit enter to search or ESC to close
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept