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China Aluminum Nitride Ceramics Manufacturers, Suppliers, Factory

We have a highly efficient team to deal with inquiries from customers. Our goal is "100% customer satisfaction by our product quality, price & our team service" and enjoy a good reputation among clients. With many factories, we can provide a wide range of Aluminum Nitride Ceramics,ESC,wafer E-chuck,electrostatic chuck semiconductor,Ceramic Suction Cup, As an experienced group we also accept custom-made orders. The main intention of our firm is to build up a satisfying memory for all consumers, and set up a long-term win-win small business connection.
Aluminum Nitride Ceramics, "Create Values,Serving Customer!" is the aim we pursue. We sincerely hope that all customers will establish long term and mutually beneficial cooperation with us.If you wish to get more details about our company, Please contact with us now!

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    Silicon Epitaxy Susceptors

    You can rest assured to buy Silicon Epitaxy Susceptors from our factory. Semicorex's Silicon Epitaxy Susceptor is a high-quality, high-purity product used in the semiconductor industry for epitaxial growth of the wafer chip. Our product has a superior coating technology that ensures the coating is present on all surfaces, preventing peeling off. The product is stable at high temperatures up to 1600°C, making it suitable for use in extreme environments.
  • MOCVD Wafer Carriers for Semiconductor Industry

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    Semicorex MOCVD Wafer Carriers for Semiconductor Industry is a top-of-the-line carrier designed for use in the semiconductor industry. Its high-purity material ensures even thermal profile and laminar gas flow pattern, delivering high-quality wafers.
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    Semicorex graphite susceptor engineered specifically for epitaxy equipment with high heat and corrosion resistance in China. Our GaN-on-SiC Substrate susceptors have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.
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  • PECVD Process

    Plasma Enhanced Chemical Vapor Deposition (PECVD) is a widely used technology in chip manufacturing. It utilizes the kinetic energy of electrons within plasma to activate chemical reactions in the gas phase, thereby achieving thin-film deposition.

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