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Monocrystalline Silicon Epitaxial Susceptor
  • Monocrystalline Silicon Epitaxial SusceptorMonocrystalline Silicon Epitaxial Susceptor
  • Monocrystalline Silicon Epitaxial SusceptorMonocrystalline Silicon Epitaxial Susceptor

Monocrystalline Silicon Epitaxial Susceptor

Perfect for graphite epitaxy and wafer handling process, Semicorex ultra-pure Monocrystalline Silicon Epitaxial Susceptor ensure minimal contamination and provide exceptionally long life performance. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

Semicorex Monocrystalline Silicon Epitaxial Susceptor is a graphite product coated with high purified SiC, which has high heat and corrosion resistance. The CVD silicon carbide coated carrier used in processes that form the epitaxial layer on semiconductor wafers, which has a high thermal conductivity, and excellent heat distribution properties.
Our Monocrystalline Silicon Epitaxial Susceptor is designed to achieve the best laminar gas flow pattern, ensuring evenness of thermal profile. This helps to prevent any contamination or impurities diffusion, ensuring high-quality epitaxial growth on the wafer chip.
Contact us today to learn more about our Monocrystalline Silicon Epitaxial Susceptor.


Parameters of Monocrystalline Silicon Epitaxial Susceptor

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of Monocrystalline Silicon Epitaxial Susceptor

- Both the graphite substrate and silicon carbide layer have good density and can play a good protective role in high temperature and corrosive working environments.
- Silicon carbide coated susceptor used for single crystal growth has a very high surface flatness.
- Reduce the difference in thermal expansion coefficient between the graphite substrate and silicon carbide layer, effectively improve the bonding strength to prevent cracking and delamination.
- Both the graphite substrate and silicon carbide layer have a high thermal conductivity, and excellent heat distribution properties.
- High melting point, high temperature oxidation resistance, corrosion resistance.




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