> Products > Barrel Single Wafer

China Barrel Single Wafer Manufacturers, Suppliers, Factory

Dependable high-quality and good credit rating standing are our principles, which will help us at a top-ranking position. Adhering into the tenet of "quality first, consumer supreme" for Barrel Single Wafer,Carrier SIC Epitaxy,Graphite Susceptors With Silicon Carbide Coating,SiC Graphite Trays,SiC Coating Of Semiconductor, To learn more about what we can do for you, contact us at any time. We look forward to establishing good and long-term business relationships with you.
Barrel Single Wafer, Based on our guiding principle of quality is the key to development, we continually strive to exceed our customers' expectations. As such, we sincerely invite all interested companies to contact us for future cooperation, We welcome old and new customers to hold hands together for exploring and developing; For more information, please feel free to contact us. Thanks. Advanced equipment, strict quality control, customer-orientation service, initiative summary and improvement of defects and extensive industry experience enable us to guarantee more customer satisfaction and reputation which, in return, brings us more orders and benefits. If you are interested in any of our products, please feel free to contact us. Inquiry or visit to our company are warmly welcome. We sincerely hope to start a win-win and friendly partnership with you. You can see more details in our website.

Hot Products

Glassy Carbon Coating Felt
Semicorex Glassy Carbon Coating Felt is a premium-grade insulation material designed to deliver exceptional thermal performance and process cleanliness in SiC epitaxial growth systems. Choose Semicorex for unmatched expertise in engineered carbon solutions, consistent product quality, and a deep commitment to supporting next-generation semiconductor manufacturing.*
High-Temperature SiC Coating for Plasma Etch Chambers
When it comes to wafer handling processes such as epitaxy and MOCVD, Semicorex's High-Temperature SiC Coating for Plasma Etch Chambers is the top choice. Our carriers provide superior heat resistance, even thermal uniformity, and durable chemical resistance thanks to our fine SiC crystal coating.
CFC Rod
Semicorex CFC Rod is specially designed for use in load-bearing applications, such as shafts in high-temperature vacuum furnaces and specialized atmosphere ovens.
Tantalum Carbide Chuck
Semicorex Tantalum Carbide Chuck is an advanced component used in semiconductor manufacturing equipment, renowned for its exceptional thermal and mechanical properties. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China*.
Horizontal SiC Wafer Boat
Semicorex Horizontal SiC Wafer Boat has emerged as an indispensable tool in the production of high-performance semiconductor and photovoltaic devices. These specialized carriers, meticulously engineered from high-purity silicon carbide (SiC), offer exceptional thermal, chemical, and mechanical properties essential for the demanding processes involved in fabricating cutting-edge electronic components.**
End Effector for Wafer Handling
Semicorex End Effector for Wafer Handling are dimensionally precise and thermally stable for wafer processing. We have been manufacturer and supplier of silicon carbide coating elements for many years. Our products have a good price advantage and cover most of the European and American markets. We look forward to becoming your long-term partner in China.

Related Blog
Reviews

Substantial growth of the SiC coated graphite susceptor market
Various applications of quartz in semiconductor manufacturing
At first glance, quartz (SiO2) material looks very similar to glass, but what is special is that ordinary glass is composed of many components (such as quartz sand, borax, boric acid, barite, barium carbonate, limestone, feldspar, soda ash, etc.), while quartz only contains SiO2, and its microstructure is a simple network composed of silicon dioxide tetrahedral structural units.
Silicon Carbide Wafer Epitaxy Technology
Silicon Carbide generally uses the PVT method, with a temperature of more than 2000 degrees, a long processing cycle, and low output, so the cost of Silicon Carbide substrates is very high.
Applications of TaC Coated Graphite Components
In the process of growing SiC and AlN single crystals by the physical vapor transport method (PVT), components such as the crucible, seed crystal holder and guide ring play a vital role. During the preparation process of SiC, the seed crystal is located in a relatively low temperature region, while the raw material is in a high temperature region exceeding 2400°C. The raw materials decompose at high temperatures to form SiXCy (including Si, SiC₂, Si₂C and other components).
Understanding the Etching Differences Between Silicon and Silicon Carbide Wafers
Etching Process: Silicon vs. Silicon Carbide
What is Silicon Nitride
Silicon nitride (Si3N4) is a key material in the development of advanced high-temperature structural ceramics.

China Barrel Single Wafer Manufacturers, Suppliers, Factory

Related Products

Hot Products

Glassy Carbon Coating Felt

High-Temperature SiC Coating for Plasma Etch Chambers

CFC Rod

Tantalum Carbide Chuck

Horizontal SiC Wafer Boat

End Effector for Wafer Handling

Substantial growth of the SiC coated graphite susceptor market

Various applications of quartz in semiconductor manufacturing

Silicon Carbide Wafer Epitaxy Technology

Applications of TaC Coated Graphite Components

Understanding the Etching Differences Between Silicon and Silicon Carbide Wafers

What is Silicon Nitride

Jerry 2023-10-01 05:41:26

jari dedenroth 2023-06-03 06:49:11

Sandy 2023-07-09 14:56:16

Christina 2024-05-09 21:10:26

Harriet 2023-12-23 09:14:28

Judy 2023-10-29 17:59:16

Send Inquiry