High-Temperature SiC Coating for Plasma Etch Chambers

At Semicorex, we understand the importance of high-quality wafer handling equipment. That's why our high-temperature SiC coating for plasma etch chambers is engineered specifically for high-temperature and harsh chemical cleaning environments. Our carriers provide even thermal profiles, laminar gas flow patterns, and prevent contamination or impurities diffusion.
Contact us today to learn more about our High-Temperature SiC Coating for Plasma Etch Chambers.

Parameters of High-Temperature SiC Coating for Plasma Etch Chambers

Features of High-Temperature SiC Coating for Plasma Etch Chambers

- Avoid peeling off and ensure coating on all surface

High temperature oxidation resistance: Stable at high temperatures up to 1600°C

High purity: made by CVD chemical vapor deposition under high temperature chlorination conditions.

Corrosion resistance: high hardness, dense surface and fine particles.

Corrosion resistance: acid, alkali, salt and organic reagents.

- Achieve the best laminar gas flow pattern

- Guarantee evenness of thermal profile

- Prevent any contamination or impurities diffusion