Vacuum Chucks

Semicorex Vacuum Chucks are precision-engineered solutions designed to provide secure, stable, and efficient handling of wafers in semiconductor manufacturing processes. These vacuum chucks are mainly used for holding wafers during various processing stages, ensuring minimal damage to the wafers, maximum stability, and enhanced process efficiency. Our vacuum chucks are available in a variety of base materials and ceramic plates, offering tailored solutions to meet the diverse needs of the semiconductor industry and other precision industries.

Key Features and Materials

Semicorex offers a range of base material options for the vacuum chuck, allowing customization based on specific application requirements:

Base Materials:

• SUS430: A stainless steel base material known for its strength and corrosion resistance, providing excellent mechanical stability.
• Aluminum Alloy 6061: Lightweight yet strong, this aluminum base offers high corrosion resistance and is ideal for applications where weight is a concern.
• Alumina Ceramic (99% Alumina): Offers high thermal stability and wear resistance. It is an excellent choice for high-precision environments where thermal resistance is critical.
• Granite: Known for its rigidity and superior vibration-damping properties, granite offers excellent stability and precision during wafer handling.
• Silicon Carbide (SiC) Ceramic: Offers high hardness, thermal conductivity, and resistance to chemical corrosion. It is perfect for high-temperature and aggressive environments.

Ceramic Plates:

Alumina (Al₂O₃): Alumina plates are known for their high electrical insulation properties, wear resistance, and high temperature stability. They are suitable for environments where minimal contamination and high performance are crucial.

Silicon Carbide (SiC): SiC ceramic plates provide exceptional hardness, high thermal conductivity, and stability at elevated temperatures, making them ideal for advanced wafer handling processes in semiconductor production.

Flatness Precision and Material Selection

The flatness of the chuck's surface is a critical factor in ensuring proper wafer handling and optimal process results. The material choice impacts the flatness precision, as well as the overall weight and thermal properties of the vacuum chuck.

Flatness Precision:

Aluminum Alloy 6061: Provides excellent flatness with precision, making it a popular choice for less demanding wafer handling tasks.

SUS430: While offering solid mechanical stability, SUS430 has a slightly lower flatness precision than aluminum alloy.

Alumina Ceramic (99% Alumina): Offers the best flatness precision due to its high dimensional stability under high temperatures and mechanical stress.

Granite: Known for its stability, granite provides precise flatness, particularly in vibration-sensitive environments.

Silicon Carbide Ceramic: Provides outstanding flatness precision and is ideal for high-precision wafer handling in high-temperature applications.

Weight Considerations

The weight of the vacuum chuck is another important factor, particularly for applications where the chuck's ease of handling and manipulation is a key consideration.