Semicorex is your partner for improving in semiconductor processing. Our silicon carbide coatings are dense, high temperature and chemical resistant, which are often used in the whole cycle of semiconductor manufacturing, including semiconductor wafer & wafer processing and semiconductor fabrication.
High-purity SiC ceramic components are crucial to processes in the semiconductor. Our offering ranges from consumables parts for wafer processing equipment, such as Silicon Carbide wafer boat, cantilever paddles, tubes, etc for Epitaxy or MOCVD.
Advantages for semiconductor processes
The thin film deposition phases such as epitaxy or MOCVD, or wafer handling processing such as etching or ion implant must endure high temperatures and harsh chemical cleaning. Semicorex supplies high-purity silicon carbide (SiC) construction provides superior heat resistance and durable chemical resistance, even thermal uniformity for consistent epi layer thickness and resistance.
Chamber Lids →
Chamber Lids used in crystal growth and wafer handling processing must endure high temperatures and harsh chemical cleaning.
Cantilever Paddle →
Cantilever Paddle is a crucial component used in semiconductor manufacturing processes, particularly in diffusion or LPCVD furnaces during processes like diffusion and RTP.
Process Tube →
Process Tube is a crucial component, specifically designed in various semiconductor processing applications such as RTP, diffusion.
Wafer Boats →
Wafer Boat is used in semiconductor processing, it has been meticulously designed to ensure the delicate wafers are kept safe during the critical stages of production.
Inlet Rings →
SiC coated gas inlet ring by MOCVD equipment Compound growth has high heat and corrosion resistance, which has great stability in extreme environment.
Focus Ring →
Semicorex supplies Silicon Carbide Coated focus ring is really stable for RTA, RTP or harsh chemical cleaning.
Wafer Chuck →
Semicorex ultra-flat ceramic vacuum wafer chucks is high purity SiC coated using in the wafer handling process.
Semicorex also have ceramic products in Alumina (Al2O3), Silicon Nitride (Si3N4), Aluminum Nitride (AIN), Zirconia (ZrO2), Composite Ceramic, etc.
Semicorex SiC Oxidation Tube is a high-performance component used in SiC tube furnaces for advanced semiconductor thermal processing. It is designed for long-term stability in extreme conditions. Choose Semicorex for our superior material purity, tight dimensional control, and consistent product quality, helping you achieve optimal results in every high-temperature run.*
Read MoreSend InquirySemicorex Alumina Mounting Base Plates are high-performance ceramic component designed for precise wafer handling in semiconductor manufacturing. Its superior strength, insulation, and thermal stability make it ideal for demanding cleanroom automation environments.*
Read MoreSend InquirySemicorex Silicon Carbide Vacuum Chuck is a high-performance wafer handling solution crafted from porous silicon carbide. It is specifically engineered for vacuum adsorption of semiconductor wafers during critical processes such as mounting (waxing), thinning, de-waxing, cleaning, dicing, and rapid thermal annealing (RTA). Choose Semicorex for unmatched material purity, dimensional precision, and reliable performance in demanding semiconductor environments.*
Read MoreSend InquirySemicorex Alumina Robot Arm is a high-performance ceramic component designed for precise wafer handling in semiconductor manufacturing. Its superior strength, insulation, and thermal stability make it ideal for demanding cleanroom automation environments.*
Read MoreSend InquirySemicorex Alumina Ceramic End Effector is a precision-engineered component specifically designed for reliable and contamination-free wafer handling in semiconductor manufacturing and related applications.*
Read MoreSend InquirySemicorex Porous SiC Chuck is a high-performance ceramic vacuum chuck designed for secure and uniform wafer adsorption in semiconductor processing. Its engineered micro-porous structure ensures excellent vacuum distribution, making it ideal for precision applications.*
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