Semicorex SiC Pipes are high-performance silicon carbide ceramic components designed for semiconductor furnace applications, delivering exceptional thermal, mechanical, and chemical stability in demanding process environments. Choose Semicorex for precision-engineered SiC pipes that ensure consistent quality, extended service life, and maximum furnace efficiency.*
Semicorex SiC pipes are ceramic parts for semiconductor furnace systems. They have unique properties which include high thermal transmission and high-temperature and chemical resistance that is required in semiconducting applications where there are extreme high-temperature and chemical environmental conditions that are expected and where properties are desirable - durability, energy efficiency, and unique stable process conditions - which allows uses to be economical in the advanced semiconductor manufacturing environments.
Semicorex SiC pipes use a high-purity fine-grain silicon carbide that is manufactured to have exceptional high-temperature mechanical stability as a result of advanced sintering and recrystallization methods and techniques. Enablement of the high-performance SiC results in exceptional mechanical strength and the retention of thermal stability at high operating temperatures. SiC has exceptional hardness that mitigates wear, or potential deformation. Additionally, attributes associated with SiC properties is low-fuel co-efficient of thermal expansion are beneficial because they limit thermal stress as there will be requirements for cycling this material between extreme high and low operating heat. In all of these considerations they have a special utility for ideal applications in diffusion furnaces, oxidation furnaces and LPCVD/PECVD systems to maintain maximum of stable process conditions are of benefit to eliminate, or limit, defects that are also metrics related to wafer or material with highly stable, even process conditions.
Another important utility of SiC pipes is the high thermal conduction profiles in specific conditions and the applicable furnace designs to produce high rates of conductive and, crucially, an even and steady distribution of temperature across the process. This reliable behavior permits wafers to be exposed to semi-equal temperature distributions in reasonable time intervals and additionally to limit thermal gradients to mitigate flat-bottomed distorted and/or defected wafers while improving more even film deposition conditions.
Chemical stability and resistance is another important performance factor. In semiconductor processes, furnace tube are subjected to the influence of highly reactive gases including oxygen, hydrogen, ammonia, and all halogens, which can degrade conventional materials in a rapid fashion. The dense and non-porous microstructure, along with chemically inert nature of SiC, protects it against oxidation and corrosion while delivering operational and mechanical performance at the extreme process environment. The durability of SiC furnaces helps them to maintain integrity of form and dimensional accuracy over long periods of time, which is important for process control and stability.
SiC pipes can be manufactured in a wide range of sizes and wall thicknesses, geometrically shaped to fit furnace designs and process needs. Exact precision machining characteristics are also maintained during the design and production of SiC pipes so that operational tolerances can be tight, with smooth internal surfaces and excellent concentricity to maintain a balance of laminar gas flow and uniform thermal profiles. Surface polishing and coatings can be provided as treatment options that will enhance performance by reducing particle generation and improving corrosion resistance.
SiC pipes have clear operational and cost advantages compared with alternative materials like quartz or alumina pipes. The initial cost for SiC components might be slightly higher, but the life of the product, the reduction in breakage, and lower maintenance requirements results in total cost of ownership that is lower costs than alternative materials and pipes.
To conclude, Semicorex SiC pipes are the best option for semiconductor furnace applications, as they provide the best thermal performance, mechanical strength, chemical resistance, and reliability for demanding production environments. This material improves process stability and assists in down-the-road cost savings and efficiency (i.e. lower energy consumption). SiC pipes are a fundamental material for modern semiconductor fabrication.