China Silicon Carbide Spray Coating Manufacturers, Suppliers, Factory

To be the stage of realizing dreams of our employees! To build a happier, far more united and far more specialist team! To reach a mutual profit of our customers, suppliers, the society and ourselves for Silicon Carbide Spray Coating,Single Crystal Silicon,4 Inch Wafer,4 Inch Wafer Carrier,Epitaxial Film Growth, We will keep working hard and as we try our best to supply the best quality products, most competitive price and excellent service to every customer. Your satisfaction, our glory!!!
Silicon Carbide Spray Coating, Make sure you really feel free to send us your requirements and we'll respond to you asap. We now have got a qualified engineering group to serve for your just about every in depth needs. Cost-free samples could be sent for yourself personally to understand much more information. In an effort to meet your requires, remember to actually feel free to make contact with us. You may send us emails and contact us directly. Moreover, we welcome visits to our factory from around the globe for much better recognizing of our organization. nd items. In our trade with merchants of numerous countries, we usually adhere for the principle of equality and mutual benefit. It is actually our hope to market, by joint efforts, each trade and friendship to our mutual advantage. We look forward to getting your inquiries.

Hot Products

  • Silicon Carbide SiC Coated Barrel Susceptor

    Silicon Carbide SiC Coated Barrel Susceptor

    Semicorex is a leading independently owned manufacturer of Silicon Carbide SiC Coated Barrel Susceptor, Precision Machined High Purity Graphite focusing on the Silicon Carbide Coated Graphite, Silicon Carbide Ceramic, MOCVP areas of semiconductor manufacturing. Our Silicon Carbide SiC Coated Barrel Susceptor have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.
  • ICP Silicon Carbon Coated Graphite

    ICP Silicon Carbon Coated Graphite

    Semicorex's ICP Silicon Carbon Coated Graphite is the ideal choice for demanding wafer handling and thin film deposition processes. Our product boasts superior heat and corrosion resistance, even thermal uniformity, and optimal laminar gas flow patterns.
  • RTP/RTA SiC Coating Carrier

    RTP/RTA SiC Coating Carrier

    Semicorex RTP/RTA SiC Coating Carrier is engineered to withstand the toughest conditions of the deposition environment. With its high heat and corrosion resistance, this product is designed to provide optimal performance for epitaxial growth. The SiC coated carrier has a high thermal conductivity and excellent heat distribution properties, ensuring reliable performance for RTA, RTP, or harsh chemical cleaning.
  • SiC Wafer Tray

    SiC Wafer Tray

    The Semicorex SiC Wafer Tray is a vital asset in the Metal-Organic Chemical Vapor Deposition (MOCVD) process, meticulously designed to support and heat semiconductor wafers during the essential step of epitaxial layer deposition. This tray is integral to semiconductor device manufacturing, where the precision of layer growth is of utmost importance. We at Semicorex are dedicated to manufacturing and supplying high-performance SiC Wafer Tray that fuse quality with cost-efficiency.
  • Tantalum Carbide Coating Halfmoon Part

    Tantalum Carbide Coating Halfmoon Part

    Semicorex Tantalum Carbide Coating Halfmoon Part is a highly specialized component designed for use in the epitaxial deposition process. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • SiC Carrier for ICP

    SiC Carrier for ICP

    Semicorex SiC Carrier for ICP is a high-performance wafer holder made of SiC-coated graphite, designed specifically for use in inductively coupled plasma (ICP) etching and deposition systems. Choose Semicorex for our world-leading anisotropic graphite quality, precision small-batch manufacturing, and uncompromising commitment to purity, consistency, and process performance.*

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