SiC Susceptor for MOCVD

Semicorex is a leading manufacturer and supplier of SiC Susceptor for MOCVD. Our product is specially designed to cater to the needs of the semiconductor industry in growing the epitaxial layer on the wafer chip. The product is used as the center plate in MOCVD, with a gear or ring-shaped design. It has high heat and corrosion resistance, making it ideal for use in extreme environments.

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Product Description

Our SiC Susceptor for MOCVD is a top-quality product that has several key features. It ensures coating on all surface, avoiding peeling off, and has high-temperature oxidation resistance, ensuring stability even at high temperatures of up to 1600°C. The product is made with high purity through CVD chemical vapor deposition under high-temperature chlorination conditions. It has a dense surface with fine particles, making it highly resistant to corrosion from acid, alkali, salt, and organic reagents.
Our SiC Susceptor for MOCVD is designed to guarantee the best laminar gas flow pattern, ensuring evenness of thermal profile. It prevents any contamination or impurities diffusion, ensuring high-quality epitaxial growth on the wafer chip.

Parameters of SiC Susceptor for MOCVD

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300

Features of SiC Susceptor for MOCVD

- Avoid peeling off and ensure coating on all surface
High temperature oxidation resistance: Stable at high temperatures up to 1600°C
High purity: made by CVD chemical vapor deposition under high temperature chlorination conditions.
Corrosion resistance: high hardness, dense surface and fine particles.
Corrosion resistance: acid, alkali, salt and organic reagents.
- Achieve the best laminar gas flow pattern
- Guarantee evenness of thermal profile
- Prevent any contamination or impurities diffusion