English
Home > Products > sic epi wafer

China sic epi wafer Manufacturers, Suppliers, Factory

Responsible excellent and fantastic credit rating standing are our principles, which will help us at a top-ranking position. Adhering towards the tenet of "quality initial, buyer supreme" for sic epi wafer,sic epitaxy,sic epi,silicon carbide epitaxy,lpe sic epitaxy, Our tenet is evident each of the time: to provide good quality solution at competitive rate to clients throughout the planet. We welcome potential purchasers to call us for OEM and ODM orders.
sic epi wafer, With a wide range, good quality, reasonable prices and stylish designs, our merchandise are extensively used in public placesand other industries. Our products are widely recognized and trusted by users and can meet continuously developing economic and social needs. We welcome new and old customers from all walks of life to contact us for future business relationships and achieving mutual success!

Related Products

Hot Products

  • SiC Finger

    SiC Finger

    Semicorex SiC Finger stands as a crucial component within semiconductor processing, work as wafer transfer tool. Shaped akin to a finger, this specialized device is meticulously crafted from silicon carbide (SiC), a material renowned for its exceptional mechanical strength, thermal stability, and resistance to harsh chemical environments. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • SiC Diffusion Furnace Tube

    SiC Diffusion Furnace Tube

    The advanced material properties of Semicorex SiC Diffusion Furnace Tube, including high flexural strength, outstanding oxidation and corrosion resistance, high wear resistance, low friction coefficient, superior high-temperature mechanical properties, and ultra-high purity, make it indispensable in the semiconductor industry, particularly for diffusion furnace applications. We at Semicorex are dedicated to manufacturing and supplying high-performance SiC Diffusion Furnace Tube that fuse quality with cost-efficiency.**
  • TaC Coated Planetary Susceptor

    TaC Coated Planetary Susceptor

    Semicorex TaC Coated Planetary Susceptor is a highly specialized component designed for use in the epitaxial processes of semiconductor manufacturing. Semicorex is dedicated to delivering top-quality products at competitive prices. We are eager to establish a long-term partnership with you in China.*
  • Silicon Carbide Composite Membrane

    Silicon Carbide Composite Membrane

    Semicorex Silicon Carbide Composite Membrane is an advanced filtration solution, combining the superior properties of silicon carbide, alumina, and calcium oxide to deliver high-performance filtration across a wide range of industries. Semicorex is the trusted choice for this cutting-edge technology, offering unmatched quality, reliability, and tailored solutions that ensure optimal efficiency and long-term performance for your filtration needs.*
  • Gas Distribution Plates

    Gas Distribution Plates

    Semicorex Gas Distribution Plates, made of CVD SiC is a critical component in plasma etching systems, designed to ensure uniform gas dispersion and consistent plasma performance across the wafer. Semicorex is the trusted choice for high-performance ceramic solutions, offering unmatched material purity, engineering precision, and dependable support tailored to the demands of advanced semiconductor manufacturing.*
  • SiC Tubes

    SiC Tubes

    Semicorex SiC Tubes are silicon carbide furnace tubes designed for semiconductor high-temperature processes, with excellent thermal stability and chemical corrosion resistance. Choosing Semicorex high-purity raw materials, precision manufacturing processes and long-term reliability guarantees to provide solid support for your semiconductor manufacturing process.*
  • Related Blog
  • Reviews

  • Main steps in SiC substrate processing

    The processing of 4H-SiC substrate mainly includes the following steps:

  • Oxidation Process

    The most basic stage of all processes is the oxidation process. The oxidation process is to place the silicon wafer in an atmosphere of oxidants such as oxygen or water vapor for high-temperature heat treatment (800~1200℃), and a chemical reaction occurs on the surface of the silicon wafer to form an oxide film (SiO2 film).

  • Isostatic Graphite Production Technology

    Isostatic pressing technology is a critical process in the manufacturing of isostatic graphite, largely determining the performance of the final product. As such, comprehensive research and optimization of isostatic graphite production remain essential focal points in the industry.

  • Understanding the Etching Differences Between Silicon and Silicon Carbide Wafers

    Etching Process: Silicon vs. Silicon Carbide

  • Exploring the Future Prospects of Silicon Semiconductor Chips

  • Semiconductor doping process

    One of the unique properties of semiconductor materials is that their conductivity, as well as their conductivity type (N-type or P-type), can be created and controlled through a process called doping. This involves introducing specialized impurities, known as dopants, into the material to form junctions on the surface of the wafer. The industry employs two main doping techniques: thermal diffusion and ion implantation.

Related Search

SiC Epi Wafersic epi wafers

Send Inquiry

Hit enter to search or ESC to close
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept