English
Home > Products > graphite cylinder rod

China graphite cylinder rod Manufacturers, Suppliers, Factory

We continuously execute our spirit of ''Innovation bringing development, Highly-quality ensuring subsistence, Management advertising and marketing gain, Credit history attracting buyers for graphite cylinder rod,graphite rod heater,graphite carbon rod,carbon electrodes,heating element, Our business has already setup a professional, creative and responsible workforce to develop purchasers together with the multi-win principle.
graphite cylinder rod, When It produced, it making use of the world's major method for reliable operation, a low failure price, it appropriate for Jeddah shoppers choice. Our enterprise. s situated inside the national civilized cities, the website traffic is very hassle-free, unique geographical and financial circumstances. We pursue a "people-oriented, meticulous manufacturing, brainstorm, make brilliant" company philosophy. Strict good quality management, fantastic service, affordable cost in Jeddah is our stand around the premise of competitors. If needed, welcome to make contact with us by our web page or phone consultation, we'll be delighted to serve you.

Related Products

Hot Products

  • SiC End Effector

    SiC End Effector

    Semicorex is a large-scale manufacturer and supplier of Silicon Carbide Coated Graphite Susceptor in China. We focus on semiconductor industries such as silicon carbide layers and epitaxy semiconductor. Our SiC End Effector has a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.
  • Epi-SiC Susceptor

    Epi-SiC Susceptor

    Semicorex Epi-SiC Susceptor, a component engineered with meticulous attention to detail, is indispensable for cutting-edge semiconductor fabrication, especially in epitaxial applications. The Epi-SiC Susceptor’s design, which embodies precision and innovation, supports the epitaxial deposition of semiconductor materials on wafers, ensuring exceptional efficiency and dependability in performance. Semicorex’s commitment to market-leading quality, allied with competitive fiscal considerations, cements our eagerness to establish partnerships in fulfilling your semiconductor wafer conveyance requisites.
  • Silicon Carbide Wafer Chuck

    Silicon Carbide Wafer Chuck

    The Semicorex Silicon Carbide Wafer Chuck is an essential component in the semiconductor epitaxial process. It serves as a vacuum chuck to securely hold wafers during critical manufacturing stages. We are committed to delivering top-quality products at competitive prices, positioning ourselves to be your long-term partner in China.*
  • Graphite Heating Industrial Element

    Graphite Heating Industrial Element

    Semicorex graphite heating industrial element is one of the most important parts of high-temperature vacuum sintering furnaces. It's essential for a variety of thermal processes due to their sophisticated material qualities.
  • SiC Coated Plate

    SiC Coated Plate

    Semicorex SiC Coated Plate is a precision-engineered component made from graphite with a high-purity silicon carbide coating, designed for demanding epitaxial applications. Choose Semicorex for its industry-leading CVD coating technology, strict quality control, and proven reliability in semiconductor manufacturing environments.*
  • Quartz Thermos Containers

    Quartz Thermos Containers

    Crafted by high-purity quartz material, Semicorex quartz thermos containers are essential components to provide support and insulation for silicon wafer carriers in semiconductor manufacturing processes to maintain stability in high-temperature environments. It is widely used in diffusion, oxidation and annealing processes in the advanced semiconductor production. Their quality directly affects the yield of silicon wafer and chip performance.
  • Related Blog
  • Reviews

  • Epitaxial Layers: The Foundation of Advanced Semiconductor Devices

    In the semiconductor industry, epitaxial layers play a crucial role by forming specific single-crystal thin films atop a wafer substrate, collectively known as epitaxial wafers. Particularly, silicon carbide (SiC) epitaxial layers grown on conductive SiC substrates produce homogenous SiC epitaxial wafers, which are instrumental in the fabrication of power devices such as Schottky diodes, MOSFETs, and IGBTs, with 4H-SiC substrates being the most widely utilized.

  • Difficulty in preparing SiC substrates

    At present, the most important direction trend of substrate development is to expand the diameter. The 6-inch mass production line in the global SiC market is maturing, and leading companies have entered the 8-inch market.

  • 4th Generation Semiconductors Gallium Oxide/β-Ga2O3

    The first generation of semiconductor materials is mainly represented by silicon (Si) and germanium (Ge), which began to rise in the 1950s. Germanium was dominant in the early days and was mainly used in low-voltage, low-frequency, medium-power transistors and photodetectors, but due to its poor high temperature resistance and radiation resistance, it was gradually replaced by silicon devices in the late 1960s. Silicon is still the main semiconductor material in the field of microelectronics due to its high technological maturity and cost advantages.

  • Why Is There Increasing Demand for High-Thermal Conductivity SiC Ceramics in the Semiconductor Industry?

    Currently, silicon carbide (SiC) is a highly active area of research in thermal conductive ceramic materials both domestically and internationally.

  • The Fatal Flaw of GaN

    ​As the world searches for new opportunities in the semiconductor field, Gallium Nitride (GaN) continues to stand out as a potential candidate for future power and RF applications. However, despite its numerous benefits, GaN faces a significant challenge: the absence of P-type products. Why is GaN hailed as the next major semiconductor material, why is the lack of P-type GaN devices a critical drawback, and what does this mean for future designs?

  • Etching Process Parameters

    Etching is a critical step in chip manufacturing, used to create minute circuit structures on silicon wafers.

Send Inquiry

Hit enter to search or ESC to close
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept