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  • SiC Coated ICP Etching Carrier

    SiC Coated ICP Etching Carrier

    Semicorex SiC Coated ICP Etching Carrier engineered specifically for epitaxy equipment with high heat and corrosion resistance in China. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.
  • SiC Coated Plate Carriers for MOCVD

    SiC Coated Plate Carriers for MOCVD

    Semicorex SiC Coated Plate Carriers for MOCVD is a high-quality carrier designed for use in the semiconductor manufacturing process. Its high purity, excellent corrosion resistance, and even thermal profile make it an excellent choice for those looking for a carrier that can withstand the demands of the semiconductor manufacturing process.
  • Soft Graphite Felt for Insulating

    Soft Graphite Felt for Insulating

    Semicorex provides high-quality soft graphite felt for insulating. We have been manufacturer and supplier of graphite materials for many years. Our soft graphite felt for insulating has a good price advantage and cover most of the European and American markets. We look forward to becoming your long-term partner in China.
  • SiC Boat

    SiC Boat

    Semicorex SiC Boat is advanced component meticulously designed for semiconductor manufacturing, specifically in diffusion and thermal processes. With our unwavering commitment to providing high-quality products at competitive prices, we are prepared to be your long-term partner in China.*
  • TaC Coating Half-moon Part

    TaC Coating Half-moon Part

    Semicorex TaC Coating Half-moon Part is a high-performance component designed for use in SiC epitaxy processes within LPE epitaxy furnaces. Choose Semicorex for unparalleled quality, precision engineering, and a commitment to advancing semiconductor manufacturing excellence.*
  • AlN Heaters

    AlN Heaters

    Semicorex AlN heaters are advanced ceramic-based heating elements designed for high-performance thermal applications. These heaters offer exceptional thermal conductivity, electrical insulation, and resistance to chemical and mechanical stress, making them ideal for demanding industrial and scientific applications. AlN heaters provide precise and uniform heating, ensuring efficient thermal management in environments requiring high reliability and durability.*
  • Related Blog
  • Reviews

  • What is SiC epitaxy?

    Silicon Carbide (SiC) epitaxy is a key technology in the field of semiconductors, particularly for the development of high-power electronic devices. SiC is a compound semiconductor with a wide bandgap, which makes it ideal for applications that require a high-temperature and high-voltage operation.

  • Why choose SiC-coated graphite susceptors?

    Graphite susceptor is one of the essential parts in the MOCVD equipment, is the carrier and the heater of the wafer substrate. Its properties of thermal stability and thermal uniformity play a decisive role in the quality of wafer epitaxial growth, which directly determines the uniformity and purity of the layer materials, in a result its quality directly affects the preparation of epitaxy.

  • What is CVD for SiC

  • Silicon Carbide Industry

    The silicon carbide industry involves a chain of processes that include substrate creation, epitaxial growth, device design, device manufacturing, packaging, and testing. In general, silicon carbide is created as ingots, which are then sliced, ground, and polished to produce a silicon carbide substrate.

  • Applications of TaC Coated Graphite Components

    In the process of growing SiC and AlN single crystals by the physical vapor transport method (PVT), components such as the crucible, seed crystal holder and guide ring play a vital role. During the preparation process of SiC, the seed crystal is located in a relatively low temperature region, while the raw material is in a high temperature region exceeding 2400°C. The raw materials decompose at high temperatures to form SiXCy (including Si, SiC₂, Si₂C and other components).

  • Annealing Processes in Modern Semiconductor Manufacturing

    As technology nodes continue to shrink, the formation of ultra-shallow junctions presents significant challenges. Thermal annealing processes including Rapid thermal annealing (RTA) and flash lamp annealing (FLA) are vital techniques that maintain high impurity activation rates while minimizing diffusion, ensuring optimal device performance.

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