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Single Crystal Silicon Showerhead

Single Crystal Silicon Showerhead

Single crystal silicon showerhead, known as the gas spray head or gas distribution plate or, is a widely used gas distribution device in semiconductor manufacturing processes for key process steps such as cleaning, etching and deposition. High-quality and cost-effective single crystal silicon showerhead is essential to improve the precision and quality of chip manufacturing in the semiconductor industry.

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Silicon Pedestal Boat

Silicon Pedestal Boat

Semicorex Silicon Pedestal Boat is a 9N ultra-high purity wafer carrier engineered for precise and stable wafer support in high-temperature oxidation, diffusion, and LPCVD processes. Choose Semicorex for unmatched material purity, precision machining, and proven reliability*

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Silicon Injector

Silicon Injector

Semicorex Silicon Injector is an ultra-high purity tubular component engineered for precise and contamination-free gas delivery in LPCVD polysilicon deposition processes. Choose Semicorex for industry-leading purity, precision machining, and proven reliability.*

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Monocrystalline Silicon Wafers

Monocrystalline Silicon Wafers

Monocrystalline silicon wafers, crafted by the excellent high-purity monocrystalline silicon, offer exceptional flatness, low defect density, and superior quality. Semicorex prioritizes customer needs and is committed to providing premium wafer solutions required for advanced semiconductor industry.

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Silicon Wafer Boat

Silicon Wafer Boat

Semicorex Silicon Wafer Boat is a high-purity carrier designed for semiconductor high-temperature furnaces, supporting wafers during oxidation and reduction processes at 1200–1250 °C. Semicorex provide superior products, ultra-clean performance, and reliable results that directly enhance device yield.*

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Silicon Shield Ring

Silicon Shield Ring

Semicorex Silicon Shield Ring is a high-purity silicon component engineered for advanced plasma etching systems, serving as both a protective shield and an auxiliary electrode. Semicorex ensures ultra-clean performance, process stability, and superior etching results with precision-engineered semiconductor components.*

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