Solid Silicon Carbide Fins

Semicorex solid silicon carbide fins are typically installed as thermal insulation components inside vertical furnace tubes of semiconductor thermal treatment equipment, such as RTP annealing furnaces and diffusion furnaces. Semicorex solid silicon carbide fins can effectively regulate temperature distribution in high-temperature furnaces and minimize heat damage to process door sealing parts caused by high temperatures. In wet oxidation operating conditions, Semicorex solid silicon carbide fins can be used to effectively prevent negative impacts on process results and semiconductor devices caused by water vapor condensation at relatively low process temperatures.

The advantages of Semicorex solid silicon carbide fins

1. Excellent wear resistance

CVD SiC features a polycrystalline cubic crystal structure, with exceptional hardness second only to diamond. The excellent wear resistance of Semicorex solid silicon carbide fins is attributed to this property, making them to withstand abrasion during handling and replacement.

2. Superior thermal management capacity

CVD SiC delivers excellent thermal resistance and high-temperature stability, which does not melt or soften at temperatures up to roughly 2000°C and maintain its stability before ultra-high temperature sublimation. Thanks to this superior thermal characteristics, Semicorex solid silicon carbide fins are highly suitable for the challenging semiconductor heat treatment processing conditions.

3. Ultra-high cleanliness

CVD-SiC is produced without sintering additives during the deposition process. Compared with conventional reaction-bonded silicon carbide, it features much higher purity, reaching over 99.9995%. This effectively prevents metallic impurity contamination of Semicorex solid silicon carbide fins caused by high temperatures in process environments, perfectly meeting the cleanliness requirement of advanced semiconductor manufacturing.

4. Reliable corrosion resistance

Semicorex solid silicon carbide fins can withstand highly oxidizing and strongly acidic process gases employed in semiconductor heat treatment processes, owing to the exceptional chemical inertness of CVD SiC at high temperatures. This reliable corrosion resistance effectively prolongs their service life, lowering component replacement costs.

5. Precise machining accuracy

To ensure compatibility with different furnace tubes, Semicorex can customize solid silicon carbide fins according to customer requirements for diameter, thickness, hole size, flatness and dimensional tolerances. This high-standard machining precision guarantees stable operation of the fins in equipment and helps optimize the overall efficiency of semiconductor heat treatment applications.