Semicorex CVD SiC-coated furnace tubes are the high-end tubular components specifically manufactured for the high-temperature semiconductor processing,such as oxidation, diffusion, and annealing of semiconductor wafers. Leveraging advanced processing technologies and mature manufacturing experience, Semicorex is committed to supplying the precision-machined CVD SiC-coated furnace tubes with market-leading quality for our valued customers.
Semicorex SiC porous ceramic debonding chucks are the essential components specially designed for adsorption and fixation of thinned ultra-thin wafers in advanced semiconductor manufacturing. Semicorex is committed to offering the precision-machined SiC porous ceramic chucks with market-leading quality for our distinguished customers.
Semicorex SiC porous ceramic vacuum chucks are the highly specialized ceramic fixtures that utilize the special structure of porous silicon carbide ceramic materials to achieve vacuum adsorption of workpieces. Leveraging state-of-the-art production technologies and mature manufacturing experience, Semicorex is committed to providing our valued customers with market-leading quality SiC porous ceramic vacuum chucks.
Semicorex SiC ceramic vacuum chucks are precision vacuum adsorption devices manufactured from silicon carbide ceramic, which can semiconductor wafers are precisely and stably positioned in specific positions during processing and inspection. Using Semicorex SiC ceramic vacuum chucks can help improve semiconductor manufacturing yields, enhance semiconductor device performance, and reduce overall manufacturing costs.
Semicorex RTA SiC wafer carriers are the essential wafer carrying tools, which are specially designed for the rapid thermal annealing process in semiconductor manufacturing. Semicorex RTA SiC wafer carriers are the optimal solutions for rapid thermal annealing process, which can help improve semiconductor manufacturing yields and enhance semiconductor device performance.
Semicorex SiC-coated Graphite Plates are high-purity carriers specifically engineered for the rigorous demands of SiC and GaN epitaxy, utilizing a dense CVD Silicon Carbide coating on an isostatic graphite substrate to provide a stable, chemically inert thermal barrier for high-yield wafer processing. Semicorex supplies qualified products and service for global customers.*
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