CVD SiC-Coated Furnace Tubes

Semicorex CVD SiC-coated furnace tubes are large-diameter process tubes that provide a stable reaction chamber for high-temperature treatment of semiconductor wafer. They are made to operate in the atmospheres containing oxygen (reactant gas), nitrogen (protective gas), and small amounts of hydrogen chloride, with a stable operating temperature of around 1250 degrees Celsius.

The advantaged of Semicorex CVD SiC-coated furnace tubes

1. Advanced molding technology and flexible customization manufacturing

Formed via 3D printing technology, Semicorex CVD SiC-coated furnace tubes feature a seamless, integral ceramic structure without any weak areas. This molding technology guarantees exceptional gas-tight seal, which effectively prevents the external contaminants and maintains the required temperature, pressure, and atmospheric environments for the semiconductor wafer processing.

Additionally, the 3D printing technology also supports the production of complex shape and the precise dimensional control. The custom-production is available for diameter, length, wall thickness, and tolerances according to various requirements to ensure full compatibility with customers’ vertical or horizontal furnaces.

2. Meticulous material selection and cleanliness control

Semicorex CVD SiC-coated furnace tubes are fabricated from carefully-selected semiconductor-grade high purity material. The impurity content of their matrix is controlled to below 300 PPM and the impurity content of CVD SiC coating is limited to less than 5 PPM. Ths stringent purity control significantly reduces wafer contamination caused by the metal impurities precipitating under high-temperature operating conditions, which greatly improving the yield and performance of the final semiconductor devices. Besides, the use of CVD SiC coating enhances the high-temperature resistance, chemical corrosion resistance, and thermal stability of Semicorex CVD SiC-coated furnace tubes, thereby greatly extending their service life under harsh operating conditions.

Boasting so many advantages, Semicorex CVD SiC-coated furnace tubes are able to provide a stable, suitable, and ultra-clean reaction space for semiconductor wafer processing. The consistent temperature distribution and steady gas atmosphere inside the furnaces, made possible by Semicorex CVD SiC-coated furnace tubes, help to achieve more accurate doping diffusion, thermal oxidation, annealing, and thin film deposition.