Semicorex SiC-coated epitaxial susceptors are the essential components used in the semiconductor epitaxial growth process to stably support and fix the semiconductor wafers. Leveraging mature manufacturing capabilities and state-of-the-art production technologies, Semicorex is committed to supplying market-leading quality and competitively priced SiC-coated epitaxial susceptors for our valued customers.
Read MoreSend InquirySiC-coated graphite MOCVD susceptors are the essential components used in Metal-organic chemical vapor deposition (MOCVD) equipment, which are responsible for holding and heating wafer substrates. With their superior thermal management, chemical resistance, and dimensional stability, SiC-coated graphite MOCVD susceptors are regarded as the optimal option for high-quality wafer substrate epitaxy.
Read MoreSend InquirySemicorex CVD TaC Coated Susceptor is a premium solution designed for MOCVD epitaxial processes, providing outstanding thermal stability, purity, and corrosion resistance under extreme process conditions. Semicorex focuses in precision-engineered coating technology that ensures consistent wafer quality, extended component lifetime, and reliable performance in every production cycle.*
Read MoreSend InquirySemicorex 8 Inch EPI Susceptor is a high-performance SiC-coated graphite wafer carrier designed for use in epitaxial deposition equipment. Choosing Semicorex ensures superior material purity, precision manufacturing, and consistent product reliability tailored to meet the demanding standards of the semiconductor industry.*
Read MoreSend InquirySemicorex SiC Coated Wafer Susceptors are high-performance carrier designed specifically for ultrathin film deposition under pressureless conditions. With advanced materials engineering, precision porosity control, and robust SiC coating technology, Semicorex delivers industry-leading reliability and customization to meet the evolving needs of next-generation semiconductor manufacturing.*
Read MoreSend InquirySemicorex Planetary Susceptor is a high-purity graphite component with a SiC coating, designed for Aixtron G5+ reactors to ensure uniform heat distribution, chemical resistance, and high-precision epitaxial layer growth.*
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