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SiC Coating Pancake Susceptor

Semicorex SiC Coating Pancake Susceptor is a high-performance component designed for use in MOCVD systems, ensuring optimal heat distribution and enhanced durability during epitaxial layer growth. Choose Semicorex for its precision-engineered products that deliver superior quality, reliability, and extended service life, tailored to meet the unique demands of semiconductor manufacturing.*

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Epitaxial Susceptor

Semicorex Epitaxial Susceptor with SiC coating is designed to support and hold SiC wafers during the epitaxial growth process, ensuring precision and uniformity in semiconductor manufacturing. Choose Semicorex for its high-quality, durable, and customizable products that meet the rigorous demands of advanced semiconductor applications.*

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MOCVD 3x2’’ Susceptor

Semicorex MOCVD 3x2’’ Susceptor developed by Semicorex represents a pinnacle of innovation and engineering excellence, specifically tailored to meet the intricate demands of contemporary semiconductor manufacturing processes.**

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TaC Coating Wafer Susceptor

Semicorex TaC Coating Wafer Susceptor is a graphite tray coated with tantalum carbide, used in silicon carbide epitaxial growth to enhance wafer quality and performance. Choose Semicorex for its advanced coating technology and durable solutions that ensure superior SiC epitaxy results and extended susceptor lifespan.*

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Wafer Susceptor

Semicorex wafer susceptor is specially designed for the semiconductor epitaxy process. It plays a vital role in ensuring the precision and efficiency of wafer handling. We are a leading enterprise in the Chinese semiconductor industry, committed to providing you with the best products and services.*

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SiC Disc Susceptor

Semicorex introduces its SiC Disc Susceptor, designed to elevate the performance of Epitaxy, Metal-Organic Chemical Vapor Deposition (MOCVD), and Rapid Thermal Processing (RTP) equipment. The meticulously engineered SiC Disc Susceptor provides with properties that guarantee superior performance, durability, and efficiency in high-temperature and vacuum environments.**

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