Silicon carbide reflecting mirrors are the precision manufactured optical components, which are specially designed for the high-precision optical system applications. With their stable optical performance and long-lasting durability, Semicorex's silicon carbide reflecting mirrors are the cutting-edge optical solution to ensure unmatched stability, reflectivity, and reliability in the most demanding environments.
Read MoreSend InquirySilicon carbide grinding barrels are the advanced ceramic containers responsible for containing materials and grinding media (such as grinding beads), while achieving the refined processing of materials. Made primarily of high-performing silicon carbide, silicon carbide grinding barrels possess excellent hardness, superior wear resistance, and exceptional thermal conductivity.
Read MoreSend InquirySilicon carbide focus rings, the crucial ring parts, are specially designed to improve the uniformity and stability of wafer etching in the semiconductor plasma etching. They are renowned for their excellent performance in promoting uniform plasma distribution and optimizing electric field environment.
Read MoreSend InquirySemicorex Quartz Crucible for Silicon Single Crystal Pulling is made of high-quality fused quartz, the crucible has multiple layers, the inner layer is extremely high quality and dense to ensure the quality of single crystal. Semicorex is professional for the Quartz Crucible for Silicon Single Crystal Pulling products with extensive experience.*
Read MoreSend InquiryMade of the high performing silicon carbide ceramic, silicon carbide cooling ducts are performant pipe components used in cooling processes of high-temperature industrial kilns. Choose Semicorex for precision-engineered Silicon carbide cooling ducts that ensure consistent quality, cost-effective price, and maximized cooling efficiency.
Read MoreSend InquirySilicon Carbide ICP Etching Plate is indispensable wafer holder manufactured by high-purity sintered silicon carbide ceramic. Specially designed by Semicorex, it serves as the crucial enablers for inductively coupled plasma (ICP) etching and deposition systems in the cutting-edge semiconductor industry.
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