CVD SiC-coated upper ground rings

CVD SiC-coated upper ground rings are typically installed in the upper region of the reaction chamber in plasma-etching equipment, surrounding the wafer electrostatic chuck. CVD SiC-coated upper ground rings are vital to the entire etching system, which can act as the physical barrier to protect device components from plasma attack and adjust the internal electric field and confine the plasma distribution range to ensure uniform etching results.

Plasma etching is a dry etching technology widely used in semiconductor manufacturing, which works by utilizing physical and chemical interactions between plasma and the surface of semiconductor materials to selectively remove specific areas, thus achieving the processing of precision structures. In the demanding environment of plasma etching, high-energy plasma causes aggressive corrosion and attack to components inside the reaction chamber. To ensure reliable and efficient operation, chamber components must have excellent corrosion resistance, mechanical properties, and low contamination characteristics. Semicorex CVD SiC-coated upper ground rings are perfectly designed to address these harsh, high-corrosion operating environments.

Reliable CVD SiC Coating

To perform better in the harsh etching conditions, Semicorex CVD SiC-coated upper ground rings are covered with a high-performing CVD SiC coating, which further enhances their performance and durability.

1. Ultra-high purity

The SiC coating fabricated via CVD process features excellent densification with ultra-high purity ( purity exceed 99.9999% ), which can prevent Semicorex CVD SiC-coated upper ground rings from high-energy plasma attack in etching applications, thereby avoiding the contamination caused by impurity particle from matrixes.

2. Improved corrosion resistance

The SiC coating fabricated via CVD process offers improved corrosion resistance, making Semicorex CVD SiC-coated upper ground rings effectively withstand the challenging corrosion from plasma ( especially corrosive gases such as halogens and fluorine ).

3. Enhanced mechanical properties

Semicorex CVD SiC-coated upper ground rings can endure the intense plasma bombardment, mechanical stress and frequent handling without deformation or fracture during long-term service thanks to the enhanced hardness and wear resistance of CVD SiC coating.

High-Standard processing and quality inspection

To perfectly adapt to the demanding semiconductor etching conditions, Semicorex CVD SiC-coated upper ground rings undergo precision machining and stringent inspection.

Surface treatment: Polishing precision is Ra < 0.1µm; fine grinding precision is Ra > 0.1µm

Processing precision is controlled within ≤ 0.03 mm

Quality inspection:

Semicorex solid CVD SiC rings are subject to ICP-MS ( inductively coupled plasma mass spectrometry )analysis.Semicorex solid CVD SiC rings are subject to dimensional measurement, resistivity testing, and visual inspection, guaranteeing that the products are free from chips, scratches, cracks, stains and other defects.