Wafer Vacuum Chuck

Perfect for next-generation lithography and wafer-handling applications, Semicorex ultra-pure ceramic components ensure minimal contamination and provide exceptionally long life performance. Our Wafer Vacuum Chuck has a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

Send Inquiry

Product Description

Semicorex ultra-flat ceramic Wafer Vacuum Chuck is high purity SiC coated using in the wafer handling process. Semiconductor Wafer Vacuum Chuck by MOCVD equipment Compound growth has high heat and corrosion resistance, which has great stablity in extreme environment, and improve yield management for semiconductor wafer processing. Low-surface-contact configurations minimize the risk of back-side particles for sensitive applications.

At Semicorex, we focus on providing high-quality, cost-effective Wafer Vacuum Chuck, we prioritize customer satisfaction and provide cost-effective solutions. We look forward to becoming your long-term partner, delivering high-quality products and exceptional customer service.

Parameters of Wafer Vacuum Chuck

Main Specifications of CVD-SIC Coating
SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Hardness	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Thermal conductivity	(W/mK)	300