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Wafer Vacuum Chuck

Wafer Vacuum Chuck

Perfect for next-generation lithography and wafer-handling applications, Semicorex ultra-pure ceramic components ensure minimal contamination and provide exceptionally long life performance. Our Wafer Vacuum Chuck has a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.

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Product Description

Semicorex ultra-flat ceramic Wafer Vacuum Chuck is high purity SiC coated using in the wafer handling process. Semiconductor Wafer Vacuum Chuck by MOCVD equipment Compound growth has high heat and corrosion resistance, which has great stablity in extreme environment, and improve yield management for semiconductor wafer processing. Low-surface-contact configurations minimize the risk of back-side particles for sensitive applications.

At Semicorex, we focus on providing high-quality, cost-effective Wafer Vacuum Chuck, we prioritize customer satisfaction and provide cost-effective solutions. We look forward to becoming your long-term partner, delivering high-quality products and exceptional customer service.


Parameters of Wafer Vacuum Chuck

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of Wafer Vacuum Chuck

● Ultra-flat capabilities

● Mirror polish

● Exceptional light weight

● High stiffness

● Low thermal expansion

● Φ 300 mm diameter and beyond

● Extreme wear resistance




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