Silicon Carbide Furnace Tubes

Installed in the horizontal heat treatment furnaces, Semicorex silicon carbide furnace tubes typically act as reaction chambers for high-temperature processing of semiconductor wafers. They can create an optimal environment for key semiconductor processes such as diffusion, oxidation and annealing and maintain temperature, pressure and gas atmosphere within required ranges, effectively ensuring the yield and performance of finished chips.

The operating environments of Semicorex silicon carbide furnace tubes

The process atmosphere: oxygen (reaction has), nitrogen (protective gas) and minor hydrogen chloride.

Max operating temperature: approx. 1250 ℃.

Such extreme operating environments pose challenges to the high stability and reliable performance of Semicorex silicon carbide furnace tubes during prolonged operation.

Advantages of of Semicorex silicon carbide furnace tubes

1. Excellent material properties

Semicorex uses high-grade silicon carbide materials to ensure the reliability of silicon carbide furnace tubes, making them deliver excellent properties listed below.

A. Superior thermal conductivity

B. Dependable mechanical strength

C. High-temperature creep resistance

D. Exceptional thermal shock resistance

E. Reliable corrosion resistance

2. Advanced forming technology

Semicorex adopts 3D printing forming technology to manufacture silicon carbide furnace tubes, delivering remarkable advantages as follows:

A. One-piece structure can eliminate assembly joints and stress weaknesses of furnace tubes.

B. Monolithic structure can significantly improve the sealing performance of silicon carbide furnace tubes.

C. The 3D printing forming technology offers flexible custom fabrication of tubes with required diameter, length, wall thickness and connector specifications, allowing them to match various requirements of various furnaces.

3. Sophisticated CVD coating technology

Semicorex silicon carbide furnace tubes are covered with a dense and uniform SiC coating via sophisticated chemical vapor deposition, which enables them to have the following excellent performance:

A. Ultra high cleanliness: The impurity content of tubes’ surface coating can be controlled to below 1 ppm.

B. Strong coating adhesive strength: This effectively minimizes coating peeling and particle shedding during operation, greatly eliminating contamination risks of wafers.

Applications in Semiconductor manufacturing

As the indispensable components in the high-end semiconductor industry, Semicorex silicon carbide furnace tubes are widely applied in many crucial processes in the following processing equipment for wafer manufacturing.

1. Wafer diffusion furnaces

2. Thermal oxidation systems

3. Annealing equipment

4. LPCVD equipment