China wet chemical etching process Manufacturers, Suppliers, Factory

Our eternal pursuits are the attitude of "regard the market, regard the custom, regard the science" along with the theory of "quality the basic, have confidence in the first and administration the advanced" for wet chemical etching process,wafer wet processing,wafer cleaning,wafer cleaning methods,semiconductor cleaning process, With the development of society and economy, our company will hold a tenet of "Focus on trust, quality the first", moreover, we assume to produce a wonderful foreseeable future with every customer.
wet chemical etching process, With the growing of the company, now our items sold and served at more than 15 countries around the world,such as Europe,North America,Middle-east,South America,Southern Asia and so on. As we bear in our mind that innovation is essential to our growth, new product development is constantly.Besides, Our flexible and efficient operation strategies,High quality products and solutions and competitive prices are exactly what our customers are looking for. Also a considerable service brings us good credit reputation.

Hot Products

  • ICP Plasma Etching System for PSS Process

    ICP Plasma Etching System for PSS Process

    Choose Semicorex's ICP Plasma Etching System for PSS Process for high-quality epitaxy and MOCVD processes. Our product is engineered specifically for these processes, offering superior heat and corrosion resistance. With a clean and smooth surface, our carrier is perfect for handling pristine wafers.
  • Ga2O3 Substrate

    Ga2O3 Substrate

    Unlock the potential of cutting-edge semiconductor applications with our Ga2O3 Substrate, a revolutionary material at the forefront of semiconductor innovation. Ga2O3, a fourth-generation wide-bandgap semiconductor, exhibits unparalleled characteristics that redefine power device performance and reliability.
  • SiC Boat for Wafer Handling

    SiC Boat for Wafer Handling

    Crafted from a silicon carbide of exceptional purity, the Semicorex SiC Boat for Wafer Handling boasts a construction that includes precision slots to secure the wafers, mitigating any movement during operational procedures. The choice of silicon carbide as the material ensures not only hardness and resilience but also the capability to endure elevated temperatures and exposure to chemicals. This makes the SiC Boat for Wafer Handling a pivotal component in a multitude of semiconductor production stages, such as the cultivation of crystals, diffusion, ion implantation, and etching processes.
  • Graphite Heater For Hot Zone

    Graphite Heater For Hot Zone

    Semicorex Graphite Heater For Hot Zone, designed to operate reliably within high-temperature furnaces, are engineered to withstand the challenging conditions inherent to processes like chemical vapor deposition (CVD), epitaxy, and high-temperature annealing. We at Semicorex are dedicated to manufacturing and supplying high-performance Graphite Heater For Hot Zone that fuses quality with cost-efficiency.**
  • AlN Single Crystal Wafer

    AlN Single Crystal Wafer

    Semicorex AlN single crystal wafer is a cutting-edge semiconductor substrate designed for high-power, high-frequency, and deep ultraviolet (UV) applications. Choosing Semicorex ensures access to industry-leading crystal growth technology, high-purity materials, and precise wafer fabrication, guaranteeing superior performance and reliability for demanding applications.*
  • High Purity SiC Cantilever Paddle

    High Purity SiC Cantilever Paddle

    Semicorex High Purity SiC Cantilever Paddle is made by high purity sintered SiC ceramic, which is a structural part in horizontal furnace in semiconductor. Semicorex is experienced company to supply SiC components in semiconductor industry.*

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