High Purity SiC Cantilever Paddle

Semicorex high purity SiC cantilever paddle is made by Silicon Carbide ceramic, generally the SiSiC. It is a SiC produced by silicon infiltration process, a process that gives silicon carbide ceramic materials better strength and performance. The high purity SiC cantilever paddle is named by its shape, it is long strip, with side fan. The shape is designed for supporting horizontal wafer boats in high temperature furnace.

It is mainly used in oxidation, diffusion, RTA/RTP in semiconductor manufacturing process. So the atmosphere is oxygen(reactive gas), nitrogen(shield gas), and a small amount of hydrogen chloride. The temperature is approximately 1250°C. So it is a high-temperature oxidation environment. It is require the part in this environment oxidation resistant and can stand under high temperature.

Semicorex high purity SiC cantilever paddle is made by 3D printed, so it is one-piece molding, and it can meet the high requirements for size and processing. The cantilever paddle will be made by 2 parts, the body and its coating, Semicorex can provide the impurity content <300pm for the body, and <5ppm for the CVD SiC coating. So the surface is ultra high purity to prevent the introducing impurities and contaminants. Also the material with high thermal shock resistance, to stay the shape in long life span.

Semicorex perform very precious route process of manufacturing. Regarding the SiC body, we prepare the raw material firstly and mix the SiC powder, then do the molding and machining to the final shape, after that we will sintering the part to improve the density and many chemical properties. The main body is formed and we will do the inspection of the ceramic itself and to meet the dimension requirement. After that we will do the important cleaning. Put the qualified cantilever paddle into the ultrasonic equipment for cleaning to remove dust, oil on the surface. After cleaning, put the high purity SiC cantilever paddle into a drying oven and bake it at 80-120°C for 4-6 hours until the water is dried.

Then we can do CVD coating on the body.The coating temperature is 1200-1500 ℃, and a suitable heating curve is selected. At high temperature, the silicon source and carbon source react chemically to generate nano-scale SiC particles. The SiC particles are continuously deposited on the surface of the

part to form a dense thin layer of SiC. The coating thickness is generally 100±20μm. After finish, the final inspection of the products will be organized, for products appearance, purity and dimensions, etc.