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China SiC mirror Manufacturers, Suppliers, Factory

Our mission is to become an innovative supplier of high-tech digital and communication devices by providing value added design, world-class manufacturing, and service capabilities for SiC mirror,RBSIC,scanning mirror,optical component,reaction-boned sic, We hope to establish far more organization associations with consumers all over the globe.
SiC mirror, To create more creative products and solutions, maintain high-quality goods and update not only our products and solutions but ourselves so as to keep us ahead of the world, and the last but most vital one: to make every client satisfied with everything we present and to grow stronger together. To be the real winner, starts here!

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    MOCVD Vacuum Chamber Lid used in crystal growth and wafer handling processing must endure high temperatures and harsh chemical cleaning. Semicorex Silicon Carbide Coated MOCVD Vacuum Chamber Lid engineered specifically stand up to these challenging environments. Our products have a good price advantage and cover many of the European and American markets. We look forward to becoming your long-term partner in China.
  • Process Tube for Diffusion Furnaces

    Process Tube for Diffusion Furnaces

    Semicorex process tube for diffusion furnaces is a specialized component used in the manufacturing of semiconductor devices. It is designed to provide a controlled environment for diffusion processes, where impurities are introduced into the semiconductor wafers to modify their electrical properties. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Isostatic Graphite

    Isostatic Graphite

    Semicorex provides high-quality isostatic graphite with customized service. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Wafer Carrier Handles

    Wafer Carrier Handles

    Semicorex Wafer Carrier Handles, made from high-quality PFA material, are designed for the safe and efficient transport of semiconductor wafers within wafer cassettes. Choose Semicorex for our commitment to providing durable, high-purity components that ensure superior performance and reliability in semiconductor manufacturing processes.*
  • CCM Brakes

    CCM Brakes

    Semicorex CCM Brakes, made from advanced carbon-ceramic matrix materials, are the ideal solution for high-performance braking in extreme driving environments. Choose Semicorex for our unmatched expertise in ceramic composite engineering, precision manufacturing, and commitment to delivering consistent, race-proven quality.*
  • High Purity SiC Cantilever Paddle

    High Purity SiC Cantilever Paddle

    Semicorex High Purity SiC Cantilever Paddle is made by high purity sintered SiC ceramic, which is a structural part in horizontal furnace in semiconductor. Semicorex is experienced company to supply SiC components in semiconductor industry.*
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  • What is the process of isostatic graphite manufacturing?

    The process of isostatic graphite manufacturing is Selecting raw materials, Blending, Molding, Isostatic pressing, Carbonization, Graphitization. 

  • What is porous graphite?

    Porous graphite, also known as porous carbon or porous graphite material, is a graphite form that has been specially engineered to have an interconnected network of pores or voids within its structure.

  • Can you grind silicon carbide?

    Silicon carbide (SiC) has important applications in areas such as power electronics, high-frequency RF devices, and sensors for high-temperature-resistant environments due to its excellent physicochemical properties. However, the slicing operation during SiC wafer processing introduces damages on the surface, which, if left untreated, can expand during the subsequent epitaxial growth process and form epitaxial defects, thus affecting the yield of the device.

  • Knowing GaN

    Recently, the semiconductor industry has continued to pay increasing attention to Gallium Nitride (GaN) technology. Due to its excellent electronic properties, Gallium Nitride devices have important applications in many high-tech fields:

  • Ion Implant and Diffusion Process

    Ion implantation is a method of semiconductor doping and one of the main processes in semiconductor manufacturing.

  • Why Doesn’t Gllium Nitride (GaN) Epitaxy Grow on a GaN substrate?

    The growth of GaN epitaxy on GaN substrate presents a unique challenge, despite the material’s superior properties when compared to silicon. GaN epitaxy offers significant advantages in terms of band gap width, thermal conductivity, and breakdown electric field over silicon-based materials. This makes the adoption of GaN as the backbone for the third generation of semiconductors, which provide enhanced cooling, lower conduction loss, and improved performance under high temperatures and frequencies, a promising and crucial advancement for the photonic and micro-electronic industries.

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