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"Control the quality by the details, show the strength by quality". Our company has strived to establish a highly efficient and stable staff team and explored an effective quality control process for SiC Coating Coated Graphite Substrate,Etch Carrier(ICP/PSS),Wafer Handling,Compound Semiconductor Wafers,Silicon Carbide Processing Components, Welcome any inquiry to our firm. We will be happy to ascertain helpful business enterprise relationships along with you!
SiC Coating Coated Graphite Substrate, Our continual availability of high grade products in combination with our excellent pre-sale and after-sales service ensures strong competitiveness in an increasingly globalized market. welcome new and old customers from all walks of life to contact us for future business relationships and mutual success!

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    Chemical vapor deposition CVD refers to the introduction of two or more gaseous raw materials into a reaction chamber under vacuum and high temperature conditions, where the gaseous raw materials react with each other to form a new material, which is deposited on the wafer surface.

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    Compression molding, isostatic pressing, and rod extrusion are the three most common methods for producing graphite rods, similar to those used for creating graphite tubes.

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