Home > Products > Silicon Carbide Coated > Barrel Susceptor > Barrel Susceptor Epi System
Barrel Susceptor Epi System

Barrel Susceptor Epi System

Semicorex Barrel Susceptor Epi System is a high-quality product that offers superior coating adhesion, high purity, and high-temperature oxidation resistance. Its even thermal profile, laminar gas flow pattern, and prevention of contamination make it an ideal choice for the growth of epixial layers on wafer chips. Its cost-effectiveness and customizability make it a highly competitive product in the market.

Send Inquiry

Product Description

Our Barrel Susceptor Epi System is a highly innovative product that offers excellent thermal performance, even thermal profile, and superior coating adhesion. Its high purity, high-temperature oxidation resistance, and corrosion resistance make it a highly reliable product for use in the semiconductor industry. Its prevention of contamination and impurities and low maintenance requirements make it a highly competitive product in the market.
At Semicorex, we focus on providing high-quality, cost-effective products to our customers. Our Barrel Susceptor Epi System has a price advantage and is exported to many European and American markets. We aim to be your long-term partner, delivering consistent quality products and exceptional customer service.
Contact us today to learn more about our Barrel Susceptor Epi System.


Parameters of Barrel Susceptor Epi System

Main Specifications of CVD-SIC Coating

SiC-CVD Properties

Crystal Structure

FCC β phase

Density

g/cm ³

3.21

Hardness

Vickers hardness

2500

Grain Size

μm

2~10

Chemical Purity

%

99.99995

Heat Capacity

J·kg-1 ·K-1

640

Sublimation Temperature

2700

Felexural Strength

MPa (RT 4-point)

415

Young’ s Modulus

Gpa (4pt bend, 1300℃)

430

Thermal Expansion (C.T.E)

10-6K-1

4.5

Thermal conductivity

(W/mK)

300


Features of Barrel Susceptor Epi System

- Both the graphite substrate and silicon carbide layer have good density and can play a good protective role in high temperature and corrosive working environments.

- Silicon carbide coated susceptor used for single crystal growth has a very high surface flatness.

- Reduce the difference in thermal expansion coefficient between the graphite substrate and silicon carbide layer, effectively improve the bonding strength to prevent cracking and delamination.

- Both the graphite substrate and silicon carbide layer have a high thermal conductivity, and excellent heat distribution properties.

- High melting point, high temperature oxidation resistance, corrosion resistance.




Hot Tags: Barrel Susceptor Epi System, China, Manufacturers, Suppliers, Factory, Customized, Bulk, Advanced, Durable

Related Category

Send Inquiry

Please feel free to give your inquiry in the form below. We will reply you in 24 hours.
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept