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  • Silicon Carbide Wafer Grinding Wheel

    Silicon Carbide Wafer Grinding Wheel

    Experience the epitome of precision in semiconductor wafer surface refinement with our cutting-edge Silicon Carbide Wafer Grinding Wheel. This disc-shaped component, meticulously designed for semiconductor equipment, redefines the standards of surface grinding, ensuring optimal results for semiconductor wafers. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • SiC Fine Powder

    SiC Fine Powder

    Semicorex SiC Fine Powder is a high-quality, ultra-fine powder known for its exceptional purity and controlled particle size distribution. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.
  • Silicon Nitride Roller

    Silicon Nitride Roller

    The Silicon Nitride Roller, presented by Semicorex, is crafted from gas pressure sintered silicon nitride (Si3N4), a high-performance ceramic material.
  • SiC Membranes

    SiC Membranes

    Semicorex SiC membranes are high-performance ceramic filtration solutions designed to meet the most demanding industrial applications with exceptional durability, chemical resistance, and thermal stability. As a leader in advanced material technology, Semicorex continues to push the boundaries of innovation, delivering superior-quality SiC membranes that set new industry standards.*
  • Silicon Carbide Vacuum Chuck

    Silicon Carbide Vacuum Chuck

    Semicorex Silicon Carbide Vacuum Chuck is a high-performance wafer handling solution crafted from porous silicon carbide. It is specifically engineered for vacuum adsorption of semiconductor wafers during critical processes such as mounting (waxing), thinning, de-waxing, cleaning, dicing, and rapid thermal annealing (RTA). Choose Semicorex for unmatched material purity, dimensional precision, and reliable performance in demanding semiconductor environments.*
  • CVD SiC Shower heads

    CVD SiC Shower heads

    Semicorex CVD SiC Shower Heads are high-purity, precision-engineered component designed for CCP and ICP etching systems in advanced semiconductor manufacturing. Choosing Semicorex means gaining reliable solutions with superior material purity, machining accuracy, and durability for the most demanding plasma processes.*
  • Related Blog
  • Reviews

  • What is the diffusion furnace?

    A diffusion furnace is a specialized piece of equipment used to introduce impurities into semiconductor wafers in a controlled manner. These impurities, called dopants, change the electrical properties of semiconductors, allowing different types of electronic components to be made. This controlled diffusion process is critical to the production of transistors, diodes and integrated circuits.

  • Understanding Dry Etching Technology in the Semiconductor Industry

    Currently, many semiconductor devices employ mesa device structures, which are predominantly created through two types of etching: wet etching and dry etching. While the simple and rapid wet etching plays a significant role in semiconductor device fabrication, it has inherent drawbacks such as isotropic etching and poor uniformity, which result in limited control when transferring small-sized patterns. Dry etching, however, with its high anisotropy, good uniformity, and repeatability, has become prominent in semiconductor device fabrication processes. The term “dry etching” broadly refers to any non-wet etching technology used for removing surface materials and transferring micro and nano patterns, including laser etching, plasma etching, and chemical vapor etching. The dry etching discussed in this text specifically pertains to the narrow application of processes using plasma discharge—either physical or chemical—to modify material surfaces.

  • Ion Implant and Diffusion Process

    Ion implantation is a method of semiconductor doping and one of the main processes in semiconductor manufacturing.

  • Specialized Preparation Techniques for Silicon Carbide Ceramics

    Silicon carbide (SiC) ceramic materials possess a range of excellent properties, including high-temperature strength, strong oxidation resistance, superior wear resistance, thermal stability, low thermal expansion coefficient, high thermal conductivity, high hardness, thermal shock resistance, and chemical corrosion resistance. These characteristics make SiC ceramics increasingly applicable in various fields such as automotive, mechanical and chemical industries, environmental protection, space technology, information electronics, and energy. SiC ceramics have become an irreplaceable structural ceramic material in many industrial sectors due to their outstanding performance.

  • Introducing Silicon Material

    Silicon is the second most abundant element on Earth after oxygen. Most silicon is found in soil, rocks, natural water, trees, and plants.

  • What is the notch on wafers?

    The wafer notch is a V-shaped or U-shaped groove on the edge of a semiconductor wafer. Far from being a defect incurred during the manufacturing process, it is the critical structural marker that was intentionally designed, whose core function lies in enabling precise positioning and orientation identification of the wafer. Wafer flat was used as the orientation marking in the early stages of wafer technology development. However, as wafer sizes gradually increased, the flat-edge design occupied more effective area, thus being gradually replaced by the more compact notch.

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