Structural differences between different types of reactors

Based on the reaction chamber configuration, heat treatment equipment (furnace tube equipment) is mainly divided into three categories: vertical furnace tubes, horizontal furnace tubes, and rapid thermal processing (RTP) furnaces.

Vertical furnace tubes have vertically arranged quartz tubes, with the wafers placed around the tubes for heating. Their main advantages are uniform temperature distribution, precise atmosphere control, high automation, less particulate contamination, small footprint, and support for batch processing (especially suitable for 12-inch wafers), making them the mainstream equipment currently available. The global market size reached $3.2 billion in 2024 (SEMI data). Their disadvantages include easy gas-liquid separation, and the downward flow of the medium potentially causing the furnace tube to burn out.

Horizontal furnace tubes have horizontally placed quartz tubes, processing 100-200 wafers at a time. Their advantages include uniform gas-liquid flow within the furnace tube and more precise temperature control. Their disadvantages include a larger footprint and a higher consumption of high-alloy steel intermediate tube supports. Structurally, horizontal furnace tubes place the wafers vertically within horizontal tubes for processing.

Rapid thermal annealing (RTP) furnaces use halogen infrared lamps to rapidly heat single wafers, offering fast heating and cooling rates that change only the wafer temperature without altering the chamber temperature. They are suitable for small-batch rapid annealing but not for mass production.

In wafer processing, horizontal furnace tubes place the wafer on a quartz boat, which in turn rests on a silicon carbide (SiC) support frame. The support frame is then pushed into the quartz furnace tube, where the wafer undergoes the reaction in a constant-temperature zone. Vertical furnace tubes, on the other hand, place the wafer on a quartz tower and slowly raise it into the quartz furnace tube for processing. After the reaction, the wafer is slowly lowered to prevent bending or breakage.

Semicorex supplies high-quality customized quartz furnace reactor. Our products are engineered to deliver superior thermal stability, extended service life, and exceptional process consistency. For customized solutions or additional technical information, please feel free to contact our engineering team.

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