China Etch Uniformity Ring Manufacturers, Suppliers, Factory

Our development depends on the advanced equipment, excellent talents and continuously strengthened technology forces for Etch Uniformity Ring,Etch Ring,Silicon Carbide Etching Ring,Plasma Etching Ring,Reactive Ion Etching Ring, Presently, we are looking forward to even larger cooperation with overseas clients based on mutual benefits. Make sure you come to feel no cost to make contact with us for more information.
Etch Uniformity Ring, we sincerely hope to establish a good and long-term business relationship with your esteemed company through this opportunity, based on equality, mutual benefit and win-win business from now to the future. "Your satisfaction is our happiness".

Hot Products

  • Al2O3 Vacuum Chuck

    Al2O3 Vacuum Chuck

    Semicorex Al2O3 Vacuum Chuck is designed to meet the rigorous demands of various semiconductor production processes, including thinning, dicing, cleaning, and transporting wafers. **
  • Etching Ring

    Etching Ring

    The Etching Ring made of CVD SiC is an essential component in the semiconductor manufacturing process, offering exceptional performance in plasma etching environments. With its superior hardness, chemical resistance, thermal stability, and high purity, CVD SiC ensures that the etching process is precise, efficient, and reliable. By choosing Semicorex CVD SiC Etching Rings, semiconductor manufacturers can enhance the longevity of their equipment, reduce downtime, and improve the overall quality of their products.*
  • Soft Graphite Felt

    Soft Graphite Felt

    Semicorex Soft Graphite Felt is a high-performance thermal insulation material designed for extreme temperature applications, offering exceptional stability and reliability. Choosing Semicorex means opting for superior quality and innovation, backed by our commitment to delivering top-tier semiconductor components that meet the highest industry standards.*
  • Wafer Carrier

    Wafer Carrier

    Semicorex SiC-coated graphite Wafer Carrier is designed to provide reliable wafer handling during semiconductor epitaxial growth processes, offering high-temperature resistance and excellent thermal conductivity. With advanced material technology and a focus on precision, Semicorex delivers superior performance and durability, ensuring optimal outcomes for the most demanding semiconductor applications.*
  • MOCVD 3x2’’ Susceptor

    MOCVD 3x2’’ Susceptor

    Semicorex MOCVD 3x2’’ Susceptor developed by Semicorex represents a pinnacle of innovation and engineering excellence, specifically tailored to meet the intricate demands of contemporary semiconductor manufacturing processes.**
  • High-purity Porous Graphite Material

    High-purity Porous Graphite Material

    As the professional manufacturer, we would like to provide you High-purity Porous Graphite Material. Semicorex provide high-quality porous graphite material with customized service, we offer high specifications porous graphite. Semicorex is committed to providing quality products at competitive prices, we look forward to becoming your long-term partner in China.

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