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Graphite Seed Chunk

Graphite Seed Chunk

The Graphite Seed Chunk plays a critical role in the production of electronic-grade polysilicon, particularly within the heating systems of single crystal furnaces.

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Graphite Ion Implanter

Graphite Ion Implanter

Semicorex Graphite Ion Implanter stands as a critical component in the realm of semiconductor manufacturing, distinguished by its fine particle composition, excellent conductivity, and resilience to extreme conditions.

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TaC Coated Graphite Part

TaC Coated Graphite Part

Semicorex TaC Coated Graphite Part is a high-performance component designed for use in SiC crystal growth and epitaxy processes, featuring a durable Tantalum Carbide coating that enhances thermal stability and chemical resistance. Choose Semicorex for our innovative solutions, superior product quality, and expertise in providing reliable, long-lasting components tailored to meet the demanding needs of the semiconductor industry.*

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TaC Coated Graphite Chuck

TaC Coated Graphite Chuck

Semicorex TaC Coated Graphite Chuck is a high-performance component designed for precise wafer handling and high-temperature processes in semiconductor manufacturing. Choose Semicorex for its innovative, durable products that ensure optimal performance and longevity in demanding semiconductor applications.*

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Graphite Insulation Plate

Graphite Insulation Plate

Semicorex Graphite Insulation Plate's unique combination of properties makes it a versatile and indispensable material across a broad spectrum of industries.

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Graphite Heater

Graphite Heater

Semicorex Graphite Heater is an advanced heating component made from high-purity isostatic graphite, designed for use in monocrystalline silicon (Si) crystal growth applications. As an essential part of semiconductor manufacturing, this product provides precise, uniform heating necessary for high-quality Si crystal production. Through its specialized design and high-performance material, it ensures optimal conditions for crystal growth, significantly enhancing the efficiency and consistency of the process.*

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