Semicorex SiC Pipes are high-performance silicon carbide ceramic components designed for semiconductor furnace applications, delivering exceptional thermal, mechanical, and chemical stability in demanding process environments. Choose Semicorex for precision-engineered SiC pipes that ensure consistent quality, extended service life, and maximum furnace efficiency.*
Read MoreSend InquirySemicorex Horizontal Chamber Furnace SiC Boats are high-purity silicon carbide carrier designed for secure wafer holding during high-temperature horizontal furnace processing. Choosing Semicorex means benefiting from precise engineering, exceptional durability, and superior thermal performance for consistent, high-yield production.*
Read MoreSend InquirySemicorex SiC Mirrors are high-performance silicon carbide optical components engineered for extreme precision in applications such as optic scan systems, lithography, and space-based telescopes. Choose Semicorex for our advanced manufacturing expertise, customizable designs, and exceptional surface finishing that ensure unmatched stability, reflectivity, and reliability in the most demanding environments.*
Read MoreSend InquirySemicorex SiC Oxidation Tube is a high-performance component used in SiC tube furnaces for advanced semiconductor thermal processing. It is designed for long-term stability in extreme conditions. Choose Semicorex for our superior material purity, tight dimensional control, and consistent product quality, helping you achieve optimal results in every high-temperature run.*
Read MoreSend InquirySemicorex Porous SiC Chuck is a high-performance ceramic vacuum chuck designed for secure and uniform wafer adsorption in semiconductor processing. Its engineered micro-porous structure ensures excellent vacuum distribution, making it ideal for precision applications.*
Read MoreSend InquirySemicorex SiC Vacuum Chucks are high-performance ceramic fixture designed for secure wafer adsorption in semiconductor manufacturing. With superior thermal, mechanical, and chemical properties, it ensures stability and precision in demanding process environments.*
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